A TFT LCD array base plate and the manufacturing method thereof
A manufacturing method and array substrate technology, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of reduced aperture ratio and increased cost, and achieve the effect of reducing the resistance of data lines
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[0035] Such as image 3 Shown, be that the flowchart of the present invention comprises the following steps:
[0036] Step 1. First deposit Gate metal on a clean glass substrate (Bare Glass) by sputtering. Gate metal is a composite film composed of one of AlNd, Al, Cu, Mo, MoW or Cr or any combination of deposition layers. , for example: Mo / AlNd / Mo composite film, AlNd / Mo composite film; then, carry out Gate photolithography, after etching process, get such as Figure 4 The structure shown, along the A-A section as Figure 5 As shown, the gate line and the gate electrode 2, and the main part 3 of the data line are obtained.
[0037]Step 2: Deposit multilayers (MultiLayer) on the substrate formed in step 1 by using chemical vapor phase (PECVD), including one or more insulating dielectric layers such as SiNx, SiOx, SiOxNy, etc., and a-Si active layer and ohmic contact Layer, gray tone active layer mask (G / T Act.Mask) is carried out by using Gray Tone technology, the active la...
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