Integrated micro-optical backlight lighting system apparatus and making method thereof
A technology for backlight illumination and system device, which is applied to microlithography exposure equipment, photolithography process exposure devices, optics, etc., can solve the problems of affecting the brightness of the light source system 100, high material cost, large light energy, etc., and achieves improved beam utilization. efficiency, power consumption reduction, and brightness enhancement effects
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Embodiment approach 1
[0043] Embodiment 1 of the present invention, please refer to figure 2 , Figure 4 , Figure 5 , Picture 11 , The integrated micro-optical backlighting system device 100 of the present invention includes a light source 200 and a lamp cover 210, as well as a light guide plate 300 and a reflection plate 400. The light guide plate 300 is a wedge-shaped light guide plate. The light guide plate 300 includes at least one incident surface 310 for receiving light beams, an exit surface 320 opposite to the incident surface 310, and a bottom surface 340 opposite to the exit surface 320. The exit surface 320 of the light guide plate 300 is distributed Micro-optical array structure formed by laser direct writing technology. The light source 200 can be a linear light source (such as a cold cathode fluorescent tube) or a point light source (such as a light emitting diode), which is arranged opposite to the incident surface 310. An 8-level quantized binary optical array structure with a fill fa...
Embodiment approach 2
[0044] The second embodiment of the present invention, please refer to image 3 , Figure 4 , Figure 5 , Picture 11The light guide plate integrated micro-optical backlighting system device 100 of the present invention includes two light sources 200, two lampshades 210, a light guide plate 300 and a reflection plate 400. The light guide plate 300 is a flat light guide plate, including an incident surface 310, an exit surface 320 intersecting the incident surface 310, and a bottom surface 340 opposite to the exit surface 320. The light source 200 is a linear light source (such as a cold cathode fluorescent tube). The light source 200 is arranged opposite to the incident surface 310. An 8-level quantized binary optical array structure with a fill factor of 100% is uniformly distributed on the exit surface 320 of the light guide plate, which has the functions of light concentrating and uniform light. The bottom surface 340 is uniformly distributed with square scattering points (which...
Embodiment approach 3
[0045] In Embodiment 3 of the present invention, the micro-optical array structure of the exit surface 320 of the light guide plate 300 of the present invention is a surface continuous relief array structure, the unit structure period is in the range of 0.5 μm to 200 μm, and the characteristic size is μm level. The structure size and density can be evenly distributed or other distribution, and the filling factor is 100%.
[0046] Another micro-optical array structure on the exit surface 320 of the light guide plate 300 of the present invention is:
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Abstract
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