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Photosensitive composition

A technology of photosensitive composition and compound, which is applied in optics, photomechanical equipment, photosensitive materials used in photomechanical equipment, etc., can solve problems such as defective products, and achieve good linearity, high resolution, no peeling and residue effect

Active Publication Date: 2010-01-13
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If this sublimation is mixed into the coloring pattern as foreign matter, it will result in defective products

Method used

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  • Photosensitive composition
  • Photosensitive composition
  • Photosensitive composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0167] [Synthesis of photopolymerizable compound]

[0168] First, Kanudo bisphenol fluorene resin represented by the following general formula (7) was synthesized.

[0169] 【chemical 15】

[0170]

[0171] In the formula, X represents a group represented by the general formula (8).

[0172] 【Chemical 16】

[0173]

[0174] In a 500ml four-necked flask, 235g of p-bisphenol fluorene type epoxy resin (epoxy equivalent 235) and 110mg of tetramethylammonium chloride, 100mg of 2,6-bis-tert-butyl-4-methylphenol and 72.0g of acrylic acid, and Dissolve it by heating at 90°C to 100°C while blowing air at a speed of 25ml / min.

[0175] Then, the solution was slowly warmed up to 120° C. for complete dissolution while maintaining the emulsified state. At this time, the solution gradually formed a transparent viscous shape and continued to stir. Meanwhile, the acid value was measured, and stirring and heating were continued for about 12 hours until the acid value was less than 1.0 m...

Embodiment 2

[0186] Except that the photopolymerization initiator initiator adopts the compound (photopolymerization initiator initiator 2) with the structure shown in the following general formula, other according to the same sequence as in Example 1, the photosensitive composition composition is prepared Adjust (refer to Table 1).

[0187] 【chemical 19】

[0188]

[0189] When synthesizing this compound, a compound represented by the following general formula was produced by the following method.

[0190] 【chemical 20】

[0191]

[0192] [where R 2 Corresponding to R in the above means 2 , corresponding to the phenyl group containing E in the present invention. ]

[0193] 【Chemical 21】

[0194]

[0195] As the above-mentioned compound 1 and the monomer, pentaerythritol tetraacrylate (PETTA) was used as the photopolymerizable compound, and the composition of the photosensitive composition of the present invention was adjusted by using the compounding ratio in Table 1. In the...

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Abstract

The invention provides a photosensitive composition capable of forming a black matrix pattern having good linearity, less liable to peel and ensuring less residue. An acyloxime ester compound represented by formula (1) is used as a photopolymerization initiator in the photosensitive composition. In the general formula (1), Ar is made to a bulky group containing a carbazole skeleton. In the general formula, R<SB>1< / SB>represents a 1-5C lower alkyl group; A represents a group selected from a 1-20C alkyl group, a 1-4C haloalkyl group, a phenyl group, CN and NO<2>; and Ar represents a group having carbazole or a substitution product thereof, or a benzoyl group which may have a substituent.

Description

technical field [0001] The present invention relates to a photosensitive composition for forming a black matrix of a liquid crystal display panel. Background technique [0002] Displays such as liquid crystal displays usually have a liquid crystal layer sandwiched between two substrates, and on each of the two substrates, electrodes formed opposite to each other are respectively arranged, and on the inside of one of the substrates, opposite to the liquid crystal layer, A color filter layer formed of pixels of red (R), green (G), blue (B), and black is arranged. Moreover, black pixels play a role in preventing color mixing of different colors and hiding electrode patterns. Usually, they are arranged in a matrix to distinguish pixels of R, G, and B colors, which is called a black matrix. [0003] Generally, color filters are formed using photolithography. Specifically, after the coating solution of a composition in which colorants such as organic pigments, dyes, or carbon bl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027
CPCG03F7/0007G03F7/027G03F7/028
Inventor 信太胜大西启之内河喜代司
Owner TOKYO OHKA KOGYO CO LTD