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Organic component supported charcoal chelating adsorbent and its preparation method and application

An adsorbent and load-type technology, which is applied in the field of purifying hydrogen peroxide solution, can solve problems such as decomposition and insufficient metal ion removal ability, and achieve the effects of inhibiting hydrogen peroxide decomposition, simple operation, and low energy consumption

Inactive Publication Date: 2007-10-17
SOUTH CHINA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] The purpose of the present invention is to provide an organic component-loaded carbon chelating adsorbent for the existing activated carbon-based adsorbents that easily cause hydrogen peroxide to decompose and have insufficient metal ion removal capabilities in hydrogen peroxide solutions.

Method used

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  • Organic component supported charcoal chelating adsorbent and its preparation method and application
  • Organic component supported charcoal chelating adsorbent and its preparation method and application
  • Organic component supported charcoal chelating adsorbent and its preparation method and application

Examples

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Embodiment 1

[0043] Prepare the load-type chelating adsorbent of the present invention according to the following steps, and carry out the operation of hydrogen peroxide adsorption and purification.

[0044] (1) get the gac 10g that has the macroscopic structure required by the present invention as carrier, soak 2 hours with the dilute hydrochloric acid solution of 10% with 100ml concentration, filter out acid solution, wash repeatedly with the deionized water of 1000ml then 5 times, filter Dry, dry at 120°C;

[0045] (2) Weigh 0.16g of 8-hydroxyquinoline, 0.025g of cyclopentanecarboxylic acid, and 0.015g of 2,2-dimethylpropionic acid (also known as t-valeric acid) and dissolve them together in 30ml of absolute ethanol to make an impregnation liquid;

[0046] (3) Place the activated carbon pretreated in step (1) in a closed container with stirring, vacuumize for 3 hours, and keep the vacuum at 9.5×10 4 Pa or above;

[0047] (4) At room temperature, inhale the impregnation solution and i...

Embodiment 2～5

[0052] Only change the step (2) in Example 1, keep the proportioning ratio of each added chemical component in Example 1, take different additions by weighing, and make the organic components account for 4%, 6%, 8%, and 4% of the adsorbent respectively. 10% by weight of chelating adsorbent. The remaining steps are carried out according to Example 1.

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Abstract

The invention relates to a chelate carbon adsorbent supported on an organic component, having activated carbon as a carrier and the organic component that is supported on the activated carbon carrier in an immersion method and distributed on a pore path of the activated carbon. The preparing method of the adsorbent comprises: dissolving the organic component in an organic solvent; immerging the activated carbon vacuumized in a maceration extract; removing the solvent; leaching the sample completely using an eluate; washing, filtering and drying the sample to obtain the adsorbent. The adsorbent is applicable for effectively removing organic impurity from a peroxide (H2O2) solution as well as various metallic element impurities such as Al, Ti, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Rb, Sr, Nb, Mo, Ag, Sb, W, Au, Hg, etc. by an adsorption process at normal temperature, meanwhile the adsorbent is capable of inhibiting catalytic decomposition of the peroxide caused by only using the activated carbon. Accordingly, the adsorbent of the invention is suitable for purifying of peroxide solution, in particular commercial grade peroxide solution having more organic impurity.

Description

technical field [0001] The invention relates to an organic component loaded carbon chelating adsorbent and a preparation method thereof. [0002] The invention also relates to the use of said adsorbent for the purification of hydrogen peroxide (H 2 o 2 ) solution method. Background technique [0003] Hydrogen peroxide (H 2 o 2 ) has a wide range of applications in industry, such as chemical synthesis, bleaching of plant fibers, wastewater treatment and as the main component of chemical polishing fluid. For applications in these fields, there are generally no special requirements for impurities in hydrogen peroxide. In the semiconductor manufacturing industry, hydrogen peroxide solution is an important processing chemical, which is usually used in the cleaning process (wet chemical treatment process) of large-scale integrated circuits, such as the use in conjunction with sulfuric acid, ammonia water, and hydrochloric acid. This process requires these processing aids (or...

Claims

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Application Information

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IPC IPC(8): B01J20/22B01J20/20
Inventor 耿建铭钱宇林倩
Owner SOUTH CHINA UNIV OF TECH