Method for increasing metal magnetic multilayer film coercive force

A metal magnetic, multi-layer film technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problems of small increase in film coercivity, increased production cost, unfavorable application, etc. Good perpendicular magnetic anisotropy, low cost, small thickness

Inactive Publication Date: 2008-03-26
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

However, after using these methods, the coercive force of the film is not greatly improved, and further improvement is needed.
There are also researchers who use subsequent heat treatment to increase the coercive force of the film (Y.Hirayama et al.J.Appl.Phys.87, 6890 (2000)), but this will inevitably lead to an increase in production costs and is not conducive to future applications.

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  • Method for increasing metal magnetic multilayer film coercive force

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Embodiment Construction

[0009] As shown in Figure 1, the sputtering process condition of the curve (a) is: the background vacuum degree of the sputtering chamber is 1×10 -5 Pa, the pressure of argon (99.99%) during sputtering is 0.9Pa. During the sputtering process, a magnetic field perpendicular to the film surface is applied to the surface of the substrate, with a magnitude of 100Oe, and the substrate rotates at a rate of 18r / min; the substrate temperature is 100°C, and the deposition temperature of the FeMn layer is 10°C;

[0010] The sputtering process condition of curve (b) is: the background vacuum of the sputtering chamber is 3×10 -5 Pa, the pressure of argon (99.99%) during sputtering is 1.2Pa. During the sputtering process, a magnetic field perpendicular to the film surface is applied to the surface of the substrate, with a magnitude of 700 Oe, and the substrate rotates at a rate of 18r / min; the substrate temperature is 200°C, and the deposition temperature of the FeMn layer is 30°C;

[00...

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Abstract

The present invention is method of raising the coercive force of multilayer magnetic metal film with antiferromagnetic material. Multilayer Pt / [CoCr / Pt]5 / FeMn / Pt film is formed through depositing on cleaned glass substrate by means of using one magnetically controlled sputtering instrument. The multilayer magnetic metal film has the advantages of small thickness, excellent vertical magnetic anisotropy and high coercive force, and is suitable for use in ultrahigh density vertical magnetic record. In addition, the deposited film needs no annealing treatment, so that the present invention has also the advantages of low cost, simple preparation, etc and is suitable for future application.

Description

technical field [0001] The invention relates to a preparation method of a metal magnetic multilayer film, and in particular provides a method for improving the magnetic properties of a metal magnetic multilayer film by using an antiferromagnetic material. Background technique [0002] The metal magnetic multilayer film structure is widely used in the reading and storage technology of magnetically recorded information. For example, Dieny et al. have prepared a spin-valve multilayer film using single crystal silicon Si / tantalum Ta / nickel-iron NiFe / copper Cu / nickel-iron NiFe / iron-manganese FeMn / tantalum Ta (B.Dieny, V.S.Speriosu, J S .Metin, et al.J.Appl.Phys.69, 4774 (1991)), this spin valve multilayer film is a practical giant magnetoresistance material that has been developed rapidly in the past ten years. , computer hard disk read head and magnetoresistive random access memory (MRAM), etc. have broad application prospects. The metal magnetic multilayer film structure is a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/18C23C14/54
Inventor 于广华冯春滕蛟李宝河李明华
Owner UNIV OF SCI & TECH BEIJING
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