Method for increasing metal magnetic multilayer film coercive force

A metal magnetic, multi-layer film technology, applied in the direction of metal material coating process, coating, ion implantation plating, etc., can solve the problems of increased production cost, unfavorable application, and small increase in film coercivity. Low cost, small thickness, good perpendicular magnetic anisotropy effect

Inactive Publication Date: 2009-12-30
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

However, after using these methods, the coercive force of the film is not greatly improved, and further improvement is needed.
There are also researchers who use subsequent heat treatment to increase the coercive force of the film (Y.Hirayama et al.J.Appl.Phys.87, 6890 (2000)), but this will inevitably lead to an increase in production costs and is not conducive to future applications.

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  • Method for increasing metal magnetic multilayer film coercive force

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Embodiment Construction

[0009] like figure 1 , the sputtering process conditions of curve (a) are: the background vacuum degree of the sputtering chamber is 1×10 -5 Pa, the pressure of argon (99.99%) was 0.9 Pa during sputtering. During the sputtering process, a magnetic field perpendicular to the direction of the film surface is applied to the surface of the substrate, with a magnitude of 100 Oe, and the substrate rotates at a rate of 18 r / min; the substrate temperature is 100 °C, and the deposition temperature of the FeMn layer is 10 °C;

[0010] The sputtering process conditions of curve (b) are: the background vacuum degree of the sputtering chamber is 3×10 -5 Pa, argon (99.99%) pressure was 1.2 Pa during sputtering. During the sputtering process, a magnetic field perpendicular to the direction of the film surface was applied to the surface of the substrate, with a magnitude of 700 Oe, and the substrate was rotated at a rate of 18 r / min; the substrate temperature was 200 °C, and the deposition ...

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Abstract

The present invention is method of raising the coercive force of multilayer magnetic metal film with antiferromagnetic material. Multilayer Pt / [CoCr / Pt]5 / FeMn / Pt film is formed through depositing on cleaned glass substrate by means of using one magnetically controlled sputtering instrument. The multilayer magnetic metal film has the advantages of small thickness, excellent vertical magnetic anisotropy and high coercive force, and is suitable for use in ultrahigh density vertical magnetic record. In addition, the deposited film needs no annealing treatment, so that the present invention has also the advantages of low cost, simple preparation, etc and is suitable for future application.

Description

technical field [0001] The invention relates to a preparation method of a metal magnetic multilayer film, and in particular provides a method for improving the magnetic properties of the metal magnetic multilayer film by using an antiferromagnetic material. Background technique [0002] Metal-magnetic multilayer structures are widely used in reading and storage technologies for magnetically recorded information. For example, Dieny et al. fabricated a spin-valve multilayer film using a single crystal Si / tantalum Ta / nickel iron NiFe / copper Cu / nickel iron NiFe / iron manganese FeMn / tantalum Ta structure (B.Dieny, V.S.Speriosu, J S .Metin, et al.J.Appl.Phys.69, 4774 (1991)), this spin valve multilayer film is a practical giant magnetoresistance material developed rapidly in the past ten years. , computer hard disk read head and magnetoresistive random access memory (MRAM) and other aspects have broad application prospects. The metal magnetic multilayer film structure is also wid...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/18C23C14/54
Inventor 于广华冯春滕蛟李宝河李明华
Owner UNIV OF SCI & TECH BEIJING
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