Method for cleaning quartz parts surface in polycrystal etching cavity

Abstract

The invention relates to a cleaning method for cleaning quartz part surface in a polycrystal etching chamber, and the core of the method is that ionized water is adopted to clean the quartz part surface and clean high pressure air is applied to blowing and drying the surface of the quartz part; then at least an organic solvent is adopted to clean the quartz part surface and next alkali solvent is used for cleaning the surface which is followed by acid solvent; finally ultrasonic wave is adopted to clean the quartz part. Through the cleaning steps the deposited dirt on the quartz part surface can be removed. By adopting the technique in the cleaning of the quartz part surface which is used for a period of time in the polycrystal etching chamber, the contamination can be completely removed without any damage to the quartz part surface and the quartz part after being cleaned can fully meet the normal technique requirements.

Description

technical field [0001] The invention relates to a method for cleaning the surface of a part, in particular to a method for cleaning the surface of a quartz part in a polycrystalline etching chamber in a microelectronic process. Background technique [0002] In the process of microelectronics process and semiconductor polysilicon etching process, many by-products are often produced as the reaction proceeds. In the process environment of the reaction chamber, the by-products will undergo a series of split polymerization reactions and recombine into polymers with complex components and structures. [0003] Parts of quartz materials have superior properties, such as high temperature stability, low particle generation, strong resistance to plasma bombardment and corrosion of chemical gases, etc. It is widely used in semiconductor process equipment, especially in semiconductor process processes under strong chemical atmosphere and plasma corrosion, such as chemical vapor depositi...

AI Technical Summary

Problems solved by technology

[0005] Most of the existing methods for cleaning quartz parts use a single organic solvent and chemical solution to scrub. The cleaning effect of this method is not very ideal, and the scrubbing is often repeated. The entire process takes a long time and is very inefficient.

And it is easy to damage the parts in the process of repeated processing, resulting in shortened service life of the parts, thus increasing the maintenance cost of the equipment