Method for forming high quality tin oxide

Abstract

The invention discloses a forming method of tin oxide with high quality. When an APCVD is used for making a low resistance with textures and highly transparent tin oxide films which are suitable for film solar cells, at first, a first layer tin oxide with textures and higher resistivity is deposited on a glass substrate, and then a second layer tin oxide with higher conductivity which is smooth itself is formed on the glass substrate. Compared with the traditional one-step formed tin oxide, the multi-step formed tin oxide is easier to satisfy various needs of film solar cells with high performance.

Description

technical field [0001] The invention belongs to the field of solar photovoltaic materials, in particular to the material technology of thin-film solar cells. Background technique [0002] In recent years, the development of photovoltaic cells and large-area photovoltaic modules has attracted widespread attention in the world. Hydrogenated amorphous silicon and nanocrystalline silicon, in particular, have shown great potential with the widespread adoption of photovoltaic devices in commercial and residential installations. A notable feature of producing thin-film silicon photovoltaic devices at such a low temperature below 260°C is that the large-area deposited silicon-related semiconductor film layers and electrical contact film layers have excellent performance. At the same time, using well-established coating equipment and procedures, low-cost stencils can be produced industrially. The laser patterning of different thin films applied on the same glass substrate allows mu...

AI Technical Summary

Problems solved by technology

[0005] However, when the thickness of tin oxide does not exceed 1000 nanometers, it is difficult to make a high degree of surface texture or roughness, that is, its ability to scatter light is often unsatisfactory

Tin oxide with a rough surface often has poor electrical conductivity and high light loss, which limits the further improvement of the photoelectric efficiency of thin-film photovoltaic devices

There have been various attempts to make the surface texture of TCO more obvious, such as chemically or mechanically treating the deposited TCO film to make the surface rougher, but the roughness obtained by this method is not as good as Very good control and repeatability, which often leads to defects in thin-film photovoltaic devices

Another approach is to make the surface of the substrate rough, but the surface texture of the tin oxide grown by this method is too sharp, which leads to structural defects of thin-film solar cells.

[0006] The traditional one-step continuous growth process of APCVD tin oxide is usually limited due to the various contradictory properties of tin oxide, that is, high transparency (light transmission), good electrical conductivity, and sufficiently high The fleece (rough surface) is difficult to obtain at the same time, especially in large-area and high-speed industrial production environments

Images