Target material and thin membrane manufactured with the target material
A target and film technology, applied in the target field, can solve problems such as shrinkage cavity, complex process, and difficult control of casting components, and achieve the effect of reducing complexity
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[0034] The first kind of target material of the present invention, its element composition is IB x -IIIA y -VIA z ;in,
[0035] IB is selected from at least one of the following groups: Cu (copper) and Ag (silver);
[0036] IIIA is selected from at least one of the following groups: In (indium) and Ga (gallium);
[0037] VIA is selected from at least one of the following groups: S (sulfur), Se (selenium) and Te (tellurium);
[0038] x is the atomic percentage of IB content, y is the atomic percentage of IIIA content, z is the atomic percentage of VIA content, and satisfies 0≤x<1, 0
[0039] The second target material of the present invention, its elemental composition is IB x -IIIA y -VIA z ;in,
[0040] IB is selected from at least one of the following groups: Cu and Ag;
[0041] IIIA is selected from at least one of the following groups: In and Ga;
[0042] VIA is selected from at least one of the following groups: S, Se and Te;
[0043]...
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