Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive resin composition and photosensitive element

一种感光性树脂、感光性组合物的技术，应用在感光性树脂组合物及感光性组件领域，能够解决正型光阻则不能具有充分分辨率、存在问题、剥离等问题，达到优良光感度的效果

Inactive Publication Date: 2008-08-27
RESONAC CORP
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, when a strong alkaline solution such as tetramethylammonium hydroxide is used for development, the unexposed part is often prone to peeling off.
Thus, the above-mentioned positive photoresist cannot have sufficient resolution
In addition, when a strong alkali aqueous solution is used, there are also environmental problems such as safety and waste liquid treatment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition and photosensitive element
  • Photosensitive resin composition and photosensitive element
  • Photosensitive resin composition and photosensitive element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～3 and comparative example 1、2

[0131] The photosensitive resin compositions of Examples 1-3 and Comparative Examples 1 and 2 were prepared by mixing (a) component, (b) component, and other components according to the composition (unit: parts by mass) shown in Table 1. The details of the compounds in Table 1 are as follows. In addition, the mass in Table 1 is the mass of a non-volatile component.

[0132] PCR-1150: acid-modified phenol novolak type epoxy acrylate oligomer (manufactured by Nippon Kayaku Co., Ltd., trade name),

[0133] DNQ: 1,2-diazoquinone compound obtained by reacting 1 mole of the compound represented by the above chemical formula (5) with 3 moles of 1,2-naphthoquinone-2-diazide-5-chlorosulfonyl,

[0134] PGMEA: Propylene Glycol Monomethyl Ether Acetate,

[0135] MEK: methyl ethyl ketone.

[0136] [Table 1]

[0137] Example 1

Example 2

Example 3

Comparative example 1

Comparative example 2

(a)

Element

Novolac resin A11

80

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
weight-average molecular weightaaaaaaaaaa
Login to View More

Abstract

A photosensitive resin composition comprising compound (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin and 1,2-quinonediazide compound (b). A photosensitive resin composition satisfactorily excelling in photosensitivity, image contrast, resolution and adherence can be obtained by addition of the component of 1,2-quinonediazide compound (b) to the component (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin.

Description

technical field [0001] The present invention relates to a photosensitive resin composition and a photosensitive component Background technique [0002] Among the image forming methods used for patterning semiconductor integrated circuits, liquid crystal display elements, printed circuit boards, etc., methods using positive photoresists obtained by combining novolak-type phenolic resins and 1,2-diazoquinone compounds are known. [0003] The positive photoresist is that the unexposed part is alkali-insoluble, and the exposed part is alkali-soluble, and the photoresist at the exposed part is removed during alkali development. At this time, the 1,2-diazoquinone compound in the above-mentioned unexposed portion will cause interaction with the novolak type phenolic resin to act as a dissolution inhibitor, thereby forming alkali insolubility. [0004] In addition, in the exposed part, the 1,2-diazoquinone compound is decomposed by the irradiation of ultraviolet rays, which causes ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/023G03F7/004G03F7/022H01L21/027
CPCG03F7/0007G03F7/0236G03F7/004G03F7/0045G03F7/008G03F7/022
Inventor 泽边贤野尻刚
Owner RESONAC CORP