CMOS image sensor and method for forming same
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SEMICON MFG INT (SHANGHAI) CORP
- Publication Date
- 2008-11-26
Smart Images
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Abstract
Description
technical field
[0001] The invention relates to the technical field of semiconductors, in particular to a CMOS image sensor and a forming method thereof. Background technique
[0002] At present, the charge coupled device (CCD) is the main practical solid-state image sensing device, which has the advantages of low read noise, large dynamic range, and high response sensitivity. The disadvantage of Complementary-Metal-Oxide-Semiconductor (CMOS) technology compatibility is that it is difficult to achieve single-chip integration with CCD-based image sensors. The CMOS image sensor (CMOS Image sensor, CIS) adopts the same CMOS technology, which can integrate the pixel array and peripheral circuits on the same chip. Compared with CCD, CIS has the advantages of small size, light weight, low power consumption, programming Convenience, ease of control, and low average cost.
[0003] At present, the patent application documents related to CMOS image sensors basically focus on how to ...