Silicon carbide ceramic and method for manufacturing composite drawing mould of diamond

A silicon carbide ceramic and diamond technology, which is applied in the field of mold technology preparation, can solve the problems that silicon carbide ceramics and diamond coating composite molds have not yet been found, the friction and wear characteristics are significantly affected, and the performance of coating products is large. The effect of solving resource crisis, improving surface finish and saving raw materials

Active Publication Date: 2008-12-10
SHANGHAI JIAO TONG UNIV +1
View PDF1 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, unlike cemented carbide materials, ceramic materials are mostly solid-phase sintered. There are a large number of structural defects in crystalline ceramics, which make the material not dense, and there are often many micropores inside. The inherent defects of ceramic materials have a great impact on its physical and mechanical properties, especially on the friction and wear characteristics, which directly affects its performance in the field of tribology instead of cemented carbide as wear-resistant materials.
[0005] After searching the literature of the prior art, it was found that the Chinese patent "Preparation Method of Diamond Composite Coated Drawing Die" (Patent No. ZL01113027.X) proposes to use a large-aperture cemented carbide die as a substrate, and use a chemical vapor phase m

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon carbide ceramic and method for manufacturing composite drawing mould of diamond
  • Silicon carbide ceramic and method for manufacturing composite drawing mould of diamond

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0026] Such as figure 1 As shown, where a is the original surface of the ceramic, showing sand holes (pit); b. is the surface after a diamond film deposition by CVD method and polished. The drastic reduction in the size of the trachoma is the result of a combination of faster diamond growth in the pits and thinning of the outer surface by polishing. c is the surface after the second CVD diamond deposition and polishing, and the size of the sand holes is further greatly reduced. d: After the third deposition and polishing, the trachoma almost disappeared. In this way, two purposes are achieved: (1) The trachoma defects gradually disappear, and the surface finish is greatly improved, which meets the requirements of the mold; (2) The diamond surface replaces the ceramic surface, because diamond is the hardest substance in the world, its Harder than ceramics (SiC, Si 3 N 4 、Al 2 o 3 etc.) are much higher, so the surface is ideally strengthened. The use of this ceramic / diamo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a preparation method for silicone carbide ceramics and diamond composite drawing die. The silicone carbide ceramics is taken as a substrate, and the process of conventional diamond coating deposition, plasma polishing, nano diamond coating deposition, and mechanical polishing is repeated for a plurality of times to remove original blister defects on the surface of an inner hole of a ceramic die. During the cycle of CVD diamond deposition and polishing, a conventional diamond coating is integrated with a nano diamond coating, the plasma polishing is integrated with the mechanical polishing, the plasma polishing is inserted between the conventional coating and the nano coating, and consequently the die becomes more adaptive to the mechanical polishing after the growth of the nano coating. The die which can replace a traditional hard alloy product not only can greatly prolong the service life of a traditional die and device, improve production efficiency, remarkably improve the quality of products concerned and effectively save raw material, but also has great significance for the great reduction of tungsten and cobalt consumption and effective solution to the resource crisis faced by the hard alloy industry.

Description

technical field [0001] The invention relates to a preparation method in the technical field of molds, in particular to a method for preparing a chemical vapor deposition (CVD) silicon carbide ceramic and diamond composite drawing mold. Background technique [0002] Drawing dies are usually made of wear-resistant materials, ideally diamond materials, followed by hard alloys to improve the life of the dies and ensure the dimensional accuracy and smoothness of the products. Considering cost and technical factors, most of the current manufacturing drawing dies use cemented carbide in the case of large aperture (d ≥ 5 mm), and diamond (polycrystalline or single crystal) is only used in small aperture occasions (d ≤ 3 mm). Mold, however, the traditional hard alloy mold wears very seriously during drawing and stranding, the working life is short, the accuracy of related products is difficult to guarantee, the surface quality is poor, the consumption of mold is large, especially the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C04B41/85B21C3/00
Inventor 孙方宏张志明沈荷生郭松寿
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products