Three-dimensional interactive display method for image-forming of photo-etching machine resists

Abstract

The invention relates to a simulated three-dimension interactive displaying method for the imaging of an anticorrosive agent of a photoetching machine. In the method of the invention, firstly, the distribution of space image intensity is calculated according to a mask pattern, and the simulation data for the imaging of the anticorrosive agent is obtained; then the imaging simulation data is rearranged, imaging simulation results are turned into the point cloud data of a three-dimension (3D) model through an illumination intensity and depth transformation model, and detailed processing and rendering calculations for the topography of surface anticorrosive agent of silicon wafers are carried out based on a continuous level method of a pattern processor, thus realizing 3D real time drawing and real time interactive roaming of the simulation results. The method of the invention realizes the real time observability and interactivity of the photoetching simulation data in a 3D space in the design of an integrated circuit chip.

Description

technical field [0001] The invention provides a method for three-dimensional interactive display of resist imaging simulation data of a lithography machine, which belongs to the technical field of simulation process of microelectronic lithography technology and the technical field of virtual reality. Background technique [0002] Lithography is a key link in the manufacture of large-scale integrated circuits, and a key process in the manufacture of complementary metal oxide semiconductors (CMOS) and system-on-chip (SOC). As large-scale integrated circuits enter the nanometer era, lithography technology is becoming more and more Lithography simulation can help semiconductor technicians simulate the lithography process, shorten the development cycle and improve product quality. It is a necessary tool for layout design. [0003] Lithography process simulation basically includes spatial image intensity distribution, exposure, post-baking, and etching, among which the etching pr...

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a three-dimensional interactive display method for resist imaging simulation of a lithography machine, which can solve the problem of three-dimensional visualization of resist imaging simulation results

Solve the problem that the existing technology does not perform three-dimensional (3D) simulation on the light intensity information generated by the imaging system and cannot perform dynamic interactive display of the resist pattern

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