Process for preparing copper-indium-selenium sputtering target
A sputtering target material, copper indium selenium technology, applied in metal material coating process, sputtering plating, ion implantation plating, etc., can solve the problems of preparing copper indium selenium thin film, etc., to achieve convenient and stable process, stable The effect of good performance and simple process
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Embodiment 1
[0019] Adopt the Cu powder that purity is 99.95% and the Se powder of 99.99%, weigh according to mass ratio 1: 1, put into graphite crucible after mixing, be placed in airtight furnace, vacuumize (less than 10 -2 Pa) after that, the graphite crucible is heated to make it warm up to 350°C for reaction, and the reaction time is 30min to prepare Cu 2 Se powder; adopt the In powder that purity is 99.99% and the Se powder of 99.99%, weigh according to mass ratio 1: 3, after mixing, put into graphite crucible, place in airtight furnace, vacuumize (less than 10 -2 Pa) after heating the graphite crucible to make it warm up to 300 ℃ for reaction, the reaction time is 30min, and In 2 Se 3 powder; obtained Cu 2 Se powder and In 2 Se 3 After the powder is mixed according to the mass ratio of 1:2.25, according to the ratio of ball to material ratio of 1:10, after ball milling for 12 hours, it is evenly filled in the mold, and cold pressed for 1 minute under the pressure of 600MPa to fo...
Embodiment 2
[0022] Adopt the Cu powder that purity is 99.95% and the Se powder of 99.99%, weigh according to mass ratio 1.6: 1, put into graphite crucible after mixing, be placed in airtight furnace, vacuumize (less than 10 -2 Pa) after charging into commercially available high-purity N 2 , keep the pressure in the furnace at 1atm, heat the graphite crucible to 450°C for reaction, the reaction time is 2h, and Cu 2 Se powder; adopt the In powder that purity is 99.99% and the Se powder of 99.99%, put into graphite crucible after weighing and mixing according to mass ratio 1:1, place in airtight furnace, vacuumize (less than 10 -2 Pa) after charging into commercially available high-purity N 2 , keep the pressure in the furnace at 1atm, heat the graphite crucible to 400°C for reaction, the reaction time is 4h, and In 2 Se 3 powder; obtained Cu 2 Se powder and In 2 Se 3 After the powder is mixed according to the mass ratio of 1:2.25, according to the ratio of ball to material ratio of 1:...
Embodiment 3
[0025] Using commercially available Cu with a purity of 99.99% 2 Se and In 2 Se 3 The powder is mixed according to the mass ratio of 1:2.25, and ball milled for 2 hours according to the ratio of ball to material ratio of 1:4, and then evenly filled in the mold, and cold pressed for 3 minutes under the pressure of 400MPa to form; the green body obtained is placed in a vacuum In the sintering furnace, use N 2 Vacuum after washing (less than 10 -2 Pa), then filled with high-purity N 2 to 1atm, start heating at this time, and pass H 2 , at the same time release the gas at the end of the furnace to keep the air pressure in the sintering furnace at 1 atm, and the green body in the furnace is heated up to 850 °C at 10 °C / min and kept for 2 hours; after the heating is completed, the ventilation is stopped, and the furnace is kept in a closed environment with a pressure of 1 atm for natural cooling After reaching room temperature, take it out to obtain the prepared copper indium s...
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