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GaN based LED and its production method

A technology for light-emitting diodes and manufacturing methods, which is applied to semiconductor devices, electrical components, circuits, etc., can solve the problems of increasing chip manufacturing costs, difficulty in realization, and irreversible production, and achieves the effect of improving brightness and improving light output efficiency.

Inactive Publication Date: 2009-01-14
EPILIGHT TECH +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] Although the above methods can increase the brightness of the light-emitting diodes to varying degrees, the first method will directly increase the manufacturing cost of the chip, and it is difficult to realize
Although the second and third methods can be realized, their main disadvantage is that once the manufacturing process fails, the product will be directly scrapped, and its production is irreversible.

Method used

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  • GaN based LED and its production method
  • GaN based LED and its production method
  • GaN based LED and its production method

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Embodiment Construction

[0058] Further illustrate the specific implementation steps of the present invention below in conjunction with accompanying drawing:

[0059] The invention provides a GaN-based light-emitting diode, especially a high-brightness light-emitting diode element with a transparent conductive layer similar to a photonic crystal microstructure, Figure 4It is a structural diagram of a GaN-based light-emitting diode according to the technology of the present invention. The GaN-based light-emitting diode includes a substrate 12 located at the bottom, and the substrate material is sapphire or Si; an N-type gallium nitride layer 24, and a quantum well light-emitting region 25. P-type gallium nitride layer 26; a transparent conductive layer 32 with a photonic crystal-like microstructure, and its microstructure arrangement can be as follows Figure 5 column-like arrangement 33 as shown, or as Image 6 grid-like arrangement 34 as shown, or as Figure 7 The mesh arrangement 35 shown; the me...

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Abstract

The invention discloses a GaN-based LED and a preparation method thereof; an organic metal gas phase deposition technique is used for growing a GaN semiconductor layer on a substrate; the GaN semiconductor layer comprises an N-typed GaN layer, a luminescent area and a P-typed GaN layer; a film-plating technique is used for steam-plating a layer of transparent conductive layer on the semiconductor layer; the steam-plating thickness d is ranging from 2000 to 4000; the transparent conductive layer is formed; an optical etching and etching technique is used for carrying out local etching so as to lead part of N-typed GaN layer to be exposed out; subsequently, an optical etching mask template of required photon-similar crystal graphics is designed; a mask is formed on the optical etching mask template by photoresist; and the transparent conductive layer is etched. On the basis of the prior art, the method of the invention further processes the transparent conductive layer, prepares the transparent conductive layer as a micro-structure with photon-similar crystal, greatly improves the light outlet efficiency of the LED and effectively improves the brightness of the LED.

Description

technical field [0001] The invention relates to a GaN-based high-brightness light-emitting diode and a manufacturing method thereof. The method can improve the brightness of the GaN-based light-emitting diode, and the method can also be applied to the production and manufacture of other light-emitting diodes. Background technique [0002] Light-emitting diodes (LEDs) have the advantages of small size, power saving, and environmental protection. They have been widely used in consumer markets such as display backlight modules, communications, computers, traffic signs, and toys. However, due to the problem of insufficient brightness, they have not been used yet. Widely used in the lighting market. In order to solve the problem of insufficient brightness of light-emitting diodes, people in the industry are constantly looking for ways to improve the brightness of light. [0003] At present, the existing mature structures of high-brightness light-emitting diodes are as follows: ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/00H01L33/38
Inventor 陈诚吕姝李士涛郝茂盛齐胜利杨卫桥陈志忠张国义
Owner EPILIGHT TECH