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Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper

A technology for drawing equipment and aberration correction, applied in optomechanical equipment, microlithography exposure equipment, circuits, etc., can solve the problems of increasing aberration, difficulty in manufacturing reference samples, and tedious scanning of electron beams accurately, and achieve high The effect of recording density

Inactive Publication Date: 2009-04-29
RICOH KK +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since it is necessary to arrange a plurality of reference patterns at corresponding prescribed positions along the circumference, each grid direction is different from other grid directions, the problem is that it is difficult to manufacture the reference sample
In addition, it is tedious to precisely scan the electron beam along the circumference of a circle or concentric circles
Furthermore, when the scanning radius of the electron beam is large, the aberration due to deflection is disadvantageously increased

Method used

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  • Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper
  • Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper
  • Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper

Examples

Experimental program
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Effect test

no. 1 example

[0110] Hereinafter, a first embodiment of the present invention is described with reference to FIGS. 1 to 9 . FIG. 1 is a schematic diagram illustrating a drawing device 100 according to a first embodiment of the present invention. Depicting device 100 is achieved by, for example, at 10 -4 A device that irradiates an electron beam on a sample under a vacuum of Pa to draw a fine pattern on the drawing surface of the sample formed by coating a resist material.

[0111] As shown in FIG. 1 , the depiction apparatus 100 includes a turntable unit 30 on which a sample is mounted, an irradiation apparatus 10 for irradiating electron beams on the sample, a vacuum chamber 50 for accommodating the turntable unit 30, and a vacuum chamber for accommodating the turntable unit 30. The main control device 70 that controls these components of the drawing apparatus 100 is integrated.

[0112] The vacuum chamber 50 is a hollow member having a rectangular shape with an open bottom (−Z direction...

no. 2 example

[0146] Next, refer to Figure 10 to 15 describe the second embodiment of the present invention. It should be noted that the same reference symbols are used for the same or equivalent components as those of the first embodiment, and descriptions of these components are omitted or reduced.

[0147] Figure 10 It is a flowchart showing a series of processes implemented by the main control device 70 in the irradiation device 10 when performing the astigmatism correction method according to the second embodiment of the present invention. In the following, the description is based on Figure 10 The astigmatism correction method of the illumination system within the illumination apparatus 10 is illustrated. suppose Figure 11 The reference sample WP shown is mounted on the rotating stage 31 of the drawing device 100, the x, y coordinate system with the origin at the center of the reference sample WP and the x', y' coordinate system rotated by 45 degrees relative to the x, y coord...

no. 3 example

[0167] Next, refer to Figures 17A to 18B A third embodiment of the present invention will be described. It should be noted that the same reference symbols are used for the same or equivalent components as those of the first and second embodiments, and descriptions of these components are omitted or reduced.

[0168] The difference between the aberration correction method of the third embodiment of the present invention and the aberration correction method of the above-mentioned second embodiment is that Figure 10 The focus adjustment process in step 201. Hereinafter, this focus adjustment method is described.

[0169] Here, since the positional relationship between the objective lens 19 and the turntable 31 is fixed, when the focusing position of the electron beam receiving the refractive power through the objective lens 19 is focused near the upper surface of the turntable 31, the The current value (hereinafter referred to as the DAC value) is defined as the reference DA...

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Abstract

A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample 'WP' and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample 'WP'. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.

Description

technical field [0001] The present invention relates to an aberration evaluation pattern, an aberration evaluation method, an aberration correction method, an electron beam drawing apparatus, an electron microscope, a master, a stamper, a recording medium and a structure, and more specifically Related to an aberration evaluation pattern for evaluating the aberration of an illumination system that scans the surface of a sample, an aberration evaluation method for evaluating the aberration of an illumination system based on an electronic signal obtained by scanning the aberration evaluation pattern with an electron beam, based on the aberration by the aberration An aberration correction method of correcting the aberration of the irradiation system by the evaluation result obtained by the evaluation method, an electron beam drawing apparatus having an irradiation system whose aberration is corrected by using the aberration correction method, having a method of correcting the aberr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G01N1/00G03F7/20H01J37/153H01J37/28H01J37/305
CPCH01J37/153H01J2237/282H01J2237/1532H01J37/28Y10T428/24479H01J37/304G03F7/70516H01J37/3174G03F7/70655G03F7/706849
Inventor 宫田弘幸宫崎武司小林一彦林国人
Owner RICOH KK
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