Polishing composition for hard disk substrate
A technology of composition and polishing liquid, which is applied in the direction of polishing composition containing abrasive, grinding device, grinding machine, etc., and can solve the problems of reducing the surface roughness and micro ripples of the hard disk substrate surface
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[0078] [Preparation Method of Polishing Liquid Composition]
[0079] The preparation method of the polishing liquid composition of the present invention is not limited in any way, for example, it can be prepared by mixing alumina particles, silica particles, an acid or its salt, and an oxidizing agent in an appropriate aqueous medium. The above-mentioned dispersion of alumina particles and silica particles can be performed using a mixer such as a homomixer, a homogenizer, an ultrasonic disperser, and a wet ball mill. The content or concentration of each component in the polishing liquid composition of the present invention is within the above-mentioned range, but as another form, the polishing liquid composition of the present invention can also be prepared in the form of a concentrate.
[0080] [Manufacturing method of hard disk substrate]
[0081] Another aspect of the present invention relates to a method of manufacturing a hard disk substrate. As the first embodiment of ...
Embodiment
[0099] Embodiments of the present invention are further illustrated below by way of examples. The following examples are for the purpose of illustrating the present invention only and should not be construed as limiting the present invention.
[0100] 1. Preparation of grinding liquid composition
[0101] α-alumina (volume median diameter of secondary particles: 0.3 μm or 0.6 μm), θ-alumina (volume median diameter of secondary particles: 0.16 μm), colloidal silica, maleic acid , citric acid, sulfuric acid (98% product), hydrogen peroxide (35% by weight product, manufactured by Asahi Denka Corporation) and water, according to the composition shown in Table 1, prepare the grinding liquid of Examples 1~33 and Comparative Examples 1~14 combination. In addition, copolymers synthesized from monomers shown in Table 4 below were added to the polishing liquid compositions of Examples 21 to 26. The solubility in Table 4 below is the solubility (g) in 100 g of water at 20°C.
[0102]...
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