Method for on-line detection of film growth rate and stress

Abstract

The invention discloses a method for on-line detection of film growth rate and stress, which comprises the following steps: (1) putting a film sample in a light path of an optical sensor, and detecting light spot position distribution information and light intensity change information of each light spot of a reflected light beam array of the detected sample so as to obtain a reflectivity curve of the film growth; (2) performing parameter fitting on the reflectivity curve through MATLAB software so as to obtain the film growth rate and refractive index information; (3) irradiating the surface of the film sample by a two-dimensional convergent beam array, detecting reflected light beam array information in a reflection direction of the surface of the film sample by a CCD device, and measuring the space length d of an incident laser beam, the incident angle alpha, the relative distance L between the sample and an array sensor, the deflection displacement delta of a light beam at the L position, and the parameter of the film thickness hf; and (4) calculating the film stress sigma by a Stoney relation equation according to the measured film substrate curvature parameters. The method can be applied to film on-line measurements in the field of manufacturing semiconductor materials and devices.

Description

[0001] The present invention is a divisional application named: thin film detection optical sensor, application number: 200610041991.3. technical field [0002] The invention belongs to the field of optical technology and relates to film detection, in particular to an online film detection method. Background technique [0003] It is well known in the industry that because stress changes in the film manufacturing process may cause the internal connection failure and delamination of the film to degrade the product quality, it is of great significance to control the degree of deformation of the film during the manufacturing process. Modern semiconductor processing requires electronic and optoelectronic equipment to precisely control the deposition process of thin film materials. At present, most processing processes need to measure parameters such as gas flow rate, deposition chamber pressure, and growth environment temperature in order to control the deposition process of thin ...

AI Technical Summary

Problems solved by technology

There are two shortcomings in this on-site film stress detection system: one is that the two laser beams must be strictly focused, which requires too high requirements for the design, installation, daily debugging and maintenance of the optical system; the other is that due to the inertia of the PSD, when the sample rotates at a high speed , can only detect the average value of the stress of the whole film, but can't do anything to detect the stress and growth rate of the local area of ​​the film

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