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Electrode sealing method in hydrogen furnace device for polysilicon production and device thereof

A hydrogenation furnace, polysilicon technology, applied in the growth of polycrystalline materials, chemical instruments and methods, crystal growth, etc., can solve the problems of hydrogen easily causing fire, short circuit between electrodes and chassis, failure of insulation, etc., to improve the conversion rate and production. Efficiency, increased feed rate, and the effect of extending service life

Active Publication Date: 2009-10-28
YICHANG CSG POLYSILICON CO LTD
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  • Description
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AI Technical Summary

Problems solved by technology

However, polytetrafluoroethylene materials can only be used safely below 250°C. In the hydrogenation furnace, silicon tetrachloride and hydrogen undergo hydrogenation reaction at a high temperature of 1150-1250°C. Although the chassis is cooled by jacketed cooling water, the electrodes are insulated. The temperature at the place still exceeds 250°C. If the PTFE material is plastically deformed or burnt and carbonized due to high temperature during the production process, its insulation function may fail, and the electrode and the chassis may contact to cause a short circuit, which will easily lead to hydrogenation. Furnace explosion and leaked hydrogen are also likely to cause fire and other safety accidents

Method used

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  • Electrode sealing method in hydrogen furnace device for polysilicon production and device thereof

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Embodiment Construction

[0021] Such as figure 1 As shown, a method for sealing electrodes in a hydrogenation furnace device for polysilicon production, a zirconia ceramic sealing device, a flexible graphite gasket and an O-ring are set between the electrode 1 and the chassis 14 to jointly realize high temperature resistance, insulation and sealing , tighten the stainless steel nut 10, the electrode 1 is tightened with the chassis 14 and the glass fiber bushing 9, so that the flexible graphite gasket, O-ring and Teflon gasket 7 are pressed and deformed to form a seal, and at the same time, the electrode 1 Pass into the cooling water.

[0022] A device for sealing electrodes in a hydrogenation furnace device for polysilicon production, including a chassis 14, an electrode 1 is connected to the chassis 14 through a stainless steel nut 10, a boss is arranged under the top of the electrode 1, and a quartz tube 4, Flexible graphite sealing ring 2, zirconia ceramic insulating sleeve 3, zirconia ceramic ins...

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Abstract

The invention discloses an electrode sealing method in a hydrogen furnace device for polysilicon production and relates to an electrode device in the hydrogen furnace for polysilicon production. By connecting cooling circulating water in the electrode and adopting special zirconia ceramics, flexible graphite, fluorubber O-shaped sealing rings and various materials, the problems of high-temperature resistance, insulation and sealing between the electrode and a chassis are solved, thereby improving the reliability of the hydrogen furnace device, ensuring the safe operation of the hydrogen furnace device and improving the productive efficiency of the hydrogen furnace device.

Description

technical field [0001] The invention relates to a hydrogenation furnace electrode for polysilicon production, in particular to a method and device for sealing electrodes in a hydrogenation furnace device for polysilicon production. Background technique [0002] The electrode sealing structure on the inner chassis of the hydrogenation furnace device for polysilicon production designed by the Russian Institute of Rare Metals uses polytetrafluoroethylene materials to achieve the following functions: During the hydrogenation reaction of silicon tetrachloride and hydrogen at high temperatures, both It plays the role of insulation, but also plays the role of absolutely reliable sealing. However, polytetrafluoroethylene materials can only be used safely below 250°C. In the hydrogenation furnace, silicon tetrachloride and hydrogen undergo hydrogenation reaction at a high temperature of 1150-1250°C. Although the chassis is cooled by jacketed cooling water, the electrodes are insulate...

Claims

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Application Information

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IPC IPC(8): C01B33/03C30B29/06F16J15/10
Inventor 曾南谢文成吴学林
Owner YICHANG CSG POLYSILICON CO LTD
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