Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

System for quickly measuring surface quality

A surface quality and measurement system technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve the problem of relatively high anti-interference ability of the measurement system, achieve the effect of low cost and increase the measurement speed

Inactive Publication Date: 2010-06-02
ZHEJIANG UNIV
View PDF0 Cites 25 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On-line measurement often needs to be carried out in a relatively obvious processing environment such as vibration and air disturbance, so the anti-interference ability of the measurement system is relatively high, and the general optical interferometer is incompetent; at the same time, in order to shorten production time and improve processing efficiency , it is required that the interferometric method should be able to complete in a short period of time, preferably within a few seconds, which poses a challenge to both white light interferometers and wavelength scanning interferometers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System for quickly measuring surface quality
  • System for quickly measuring surface quality
  • System for quickly measuring surface quality

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] As shown in the drawings, the present invention comprises two sets of interferometers coupled together, wherein:

[0020] 1) A set of main interferometer for measurement: including data acquisition card 1, computer 2, image acquisition card 3, three beam splitters 4, 14, 15, camera 5, two objective lenses 7, 13, reference mirror 10, imaging Lens 11, collimating mirror 16, tunable optical filter 17, white light source 18 and optical filter driving unit 20; the incident light emitted by white light source 18 becomes parallel light after passing through tunable optical filter 17 and collimating mirror 16 1. After passing through the first beam splitter 15 to the second beam splitter 14, the incident light is divided into two paths, one path of light is incident on the reference mirror 10 through the first objective lens 7, and the other path is incident on the measured sample 12 through the second objective lens 13 surface, the light incident on the surface of the referenc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a system for quickly measuring surface quality. The system comprises two sets of common-path interferometers, wherein one set of reference interferometer for noise compensation is specially used for detecting noises such as vibration, air disturbance and the like in environment, and eliminating the influence of interference of the background noises through negative feedback; and the other set of main interferometer for measurement controls wavelength of optical wave incident to the interferometers by using an acousto-optic filter, and can quickly acquire a three-dimensional feature of a surface to be measured by processing a generated interference signal by using large-scale parallel computation based on GPGPU. The system can measure the surface quality in real time, does not need mechanical light path scanning in the process of measurement, and can reach a high measurement speed. The system can be updated one time in 1 to 2 seconds on average, and can be updated more frequently after being optimized. The system can reduce influence of environmental noise on the measurement by adding the active optical path compensation technology, achieves measurement accuracy of sub-nano range, reduces cost, saves a usually expensive high-precision translation stage and can be used for processing workshops with more interference.

Description

technical field [0001] The invention relates to an optical measuring instrument, in particular to a fast surface quality measuring system. Background technique [0002] Surface quality testing affects the performance of most industrial products. According to surveys, more than 90% of engineering component failures start from the surface. Therefore, in the process of product processing, the detection of surface quality, including surface shape, waviness, roughness, etc., can accurately control the processing procedure so that the product can obtain the best quality and service life, and reduce the scrap rate. For high-precision machining, online measurement is particularly important. In addition, online surface inspection can also detect the wear condition of the machining tool in time and replace it before it is damaged. Due to the environmental restrictions in the processing process, it is generally required that the online detection method must have the characteristics o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01B11/00G01B11/30G01B9/02
Inventor 汪凯巍杨将新曹衍龙金鹭汪琛琛
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products