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Photosensitive resin composite and color filter therefrom

A photosensitive resin and composition technology, applied in optics, optical components, optomechanical equipment, etc., can solve problems such as water residue

Active Publication Date: 2010-06-23
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, in the photosensitive resin composition dispersed by using pigments with a small average particle size, there will be problems such as water residue after the washing process of development

Method used

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  • Photosensitive resin composite and color filter therefrom
  • Photosensitive resin composite and color filter therefrom
  • Photosensitive resin composite and color filter therefrom

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example (B-1

[0099] A nitrogen inlet, stirrer, heater, condenser and thermometer are arranged on a four-necked conical flask with a volume of 1000 milliliters, and nitrogen is introduced and the feed composition is added in the amount shown in Table 1. The above feed composition includes: 2 - 15 parts by weight of methacryloylethoxysuccinate monomer (hereinafter referred to as HOMS), 30 parts by weight of methacrylic acid monomer (hereinafter referred to as MAA), 10 parts by weight of styrene monomer (hereinafter referred to as SM), 25 parts by weight of benzyl methacrylate monomer (hereinafter referred to as BzMA), 10 parts by weight of 2-hydroxyethyl methacrylate monomer (hereinafter referred to as HEMA), 10 parts by weight of methyl acrylate monomer (hereinafter referred to as MA), And 200 parts by weight of the solvent ethyl 3-ethoxy propionate (hereinafter referred to as EEP). Wherein, the feeding method of the monomer mixture is to add all at once.

[0100] When the contents of the ...

Synthetic example (B-2

[0102] Synthesis example (B-2)~(B-5)

[0103] Same as the operation method of the synthesis example (B-1), the difference is that the type and mixing amount of the monomers used for polymerization are changed, and the formula is shown in Table 1.

[0104] [Synthesis Example of Alkali-Insoluble Resin (B')]

[0105] Synthesis example (B'-1)

[0106] With the operating method of Synthesis Example (B-1), the difference is to change the type and mixing amount of monomers for polymerization, and the monomer feed composition includes: 40 parts by weight of BzMA monomer, 25 parts by weight of MMA monomer, and 35 parts by weight of MA monomer.

[0107] [Example and Comparative Example of Photosensitive Resin Composition]

Embodiment 1

[0109] Pigment (A) C.I.Pigment R254 / C.I.Pigment Y139=80 / 20 (hereinafter referred to as A-1) 100 parts by weight shown in Table 2, alkali-soluble resin (B-1) 95 parts by weight (solid content), DPCA-120 (hereinafter referred to as C-1-1) 70 parts by weight, 2-benzyl-2-N, N-dimethylamine-1-(4-morpholinophenyl)-1-butanone (hereinafter referred to as D-1 ) 6 parts by weight, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole (hereinafter referred to as D-2) 6 parts by weight, 4,4'- Two (diethylamine) benzophenone (hereinafter referred to as D-3) 5 parts by weight, solvent EEP (hereinafter referred to as E-1) 1000 parts by weight, propylene glycol methyl ether acetate (hereinafter referred to as E-2) 500 parts by weight and Dispersant Ajisper PB-821 (hereinafter referred to as F-1) 30 parts by weight of the mixed solution, with a bead mill [beadsmill, manufactured by Mitsubishi Heavy Industries, trade name: DIAMOND FINE MILL, the diameter of the grinding beads (beads) of the...

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Abstract

The invention relates to a photosensitive resin composite of a liquid crystal display element, in particular to a photosensitive resin composite for a color filter without residual water after the washing process for developing. The composite comprises pigment (A), alkali solubility resin (B), a compound (C) containing an ethylene unsaturated group, photoinitiator (D) and organic solvent (E), wherein, the average particle size (P, unit: nm) of the pigment (A) and the acid value (V, unit: mg.KOH / g) of the photosensitive resin composite conform to the following relation expression: P2 / V=320-1440; in addition, the compound (C) containing the ethylene unsaturated group comprises the compound (C-1) obtained by reaction of multivalent alcohol modified by caprolactone and (methyl) crylic acid.

Description

technical field [0001] The invention relates to a photosensitive resin composition of a liquid crystal display element. In particular, it provides a photosensitive resin composition for a color filter without water residue after the washing process of development. Background technique [0002] At present, color filters have been widely used in color liquid crystal display elements, color facsimile machines, color cameras and other application fields. As the market demand for office equipment such as color liquid crystal display components is expanding day by day, the production technology of color filters is also tending to be diversified. [0003] Usually, color filters can be made by forming red, green, blue and other pixels on a transparent glass substrate by methods such as dyeing, printing, electroplating, and pigment dispersion. Generally speaking, in order to improve the contrast of the color filter, a light-shielding layer (or black matrix) can be arranged between ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/028G02B5/23G02F1/1335
Inventor 许荣宾郑仲恩林伯宣
Owner CHI MEI CORP