Silicon-based thin film solar cell with microcrystalline silicon-germanium thin film as intrinsic layer and preparation method thereof

A technology of microcrystalline silicon germanium and solar cells, applied in the field of solar cells, can solve problems such as uneven structural order, inconsistent structure, and affecting device performance, and achieve the effects of novel structure, easy operation, and simple preparation process

Inactive Publication Date: 2010-06-23
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Studies have shown that compared to SiH 4 In terms of GeH 4 It is easy to decompose and can be quickly integrated into the film, but there is a problem that H atoms are preferentially bonded to Si in the plasma, which makes the structure of the film with Si a

Method used

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  • Silicon-based thin film solar cell with microcrystalline silicon-germanium thin film as intrinsic layer and preparation method thereof
  • Silicon-based thin film solar cell with microcrystalline silicon-germanium thin film as intrinsic layer and preparation method thereof
  • Silicon-based thin film solar cell with microcrystalline silicon-germanium thin film as intrinsic layer and preparation method thereof

Examples

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Embodiment 1

[0021] A silicon-based thin-film solar cell whose intrinsic layer is a microcrystalline silicon-germanium thin film, comprising a transparent substrate 1, a transparent conductive thin film 2, a P-type window layer 3, an intrinsic layer I 4, N + Layer 5, back reflection electrode 6 and metal electrode 7, the back reflection electrode 6 is ZnO, the metal electrode 7 is silver, and the intrinsic layer I4 is a microcrystalline silicon germanium film. In this silicon germanium thin film solar cell, the preparation method of the microcrystalline silicon germanium thin film as intrinsic layer comprises the following steps: 1) the Corning7059 glass substrate that thickness is 1.5mm and is plated with ZnO transparent conductive thin film is placed in vacuum chamber, The background vacuum is higher than 2×10 -4 Pa; 2) Under the condition of feeding reaction gas silane, germane, germanium fluoride and hydrogen into the reaction chamber, deposit microcrystalline silicon germanium film, t...

Embodiment 2

[0023] A silicon-based thin-film solar cell whose intrinsic layer is a microcrystalline silicon-germanium thin film, its structure and materials are basically the same as those in Example 1, except that the metal electrode M7 is aluminum. The preparation method of the microcrystalline silicon germanium thin film as the intrinsic layer is also basically the same as in Example 1, the difference is that the transparent conductive film adopts SnO 2 -ZnO composite transparent conductive film. The microcrystalline silicon-based thin film solar cell prepared by this method has been tested and shown that when the thickness of the intrinsic layer is 750nm, the short-circuit current reaches 23mA / cm 2 , the photoelectric conversion efficiency reaches 6.0%.

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Abstract

The invention discloses a silicon-based thin film solar cell with a microcrystalline silicon-germanium thin film as an intrinsic layer, which comprises a transparent substrate, a transparent conductive thin film, a P-shaped window layer, an intrinsic layer I, an N+ layer, a back reflection electrode and a metal electrode, wherein the intrinsic layer is the microcrystalline silicon-germanium thin film. The preparation method of the microcrystalline silicon-germanium thin film comprises the following steps of: (1) placing a glass substrate with the transparent conductive film into a vacuum chamber, wherein the base vacuum is higher than 2*10-4Pa; and (2) under the condition of introducing reactant gas silane, germane, fluorogermanate and hydrogen in a reaction chamber, precipitating the microcrystalline silicon-germanium thin film. The invention has the advantages that the silicon-based thin film cell has novel structure, the prepared microcrystalline silicon-germanium thin film material has the advantages of narrow band gap, low defect, high photosensitivity, simple process, easy operation, and low manufacturing cost, and the silicon-based thin film cell adopting the material can improve the spectral response range, stability and conversion efficiency.

Description

【Technical field】 [0001] The invention relates to the technical field of solar cells in new energy sources, in particular to a silicon-based thin-film solar cell whose intrinsic layer is a microcrystalline silicon-germanium thin film and a preparation method thereof. 【Background technique】 [0002] Energy is the driving force for the development of a country. In an era when fossil energy is becoming increasingly exhausted, research on new alternative energy will be a guarantee for the sustainable development of the national economy and a symbol of national strength. [0003] Looking at the object used by solar cells - the spectrum of sunlight, it has less than 50% of the energy in the visible light part. To increase the efficiency of the cell, it is important to extend its spectral response below 1.1 microns, since this includes more than 90% of the energy of sunlight. Germanium is a narrow-bandgap semiconductor material with a bandgap of 0.66ev. It is difficult to form a ...

Claims

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Application Information

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IPC IPC(8): H01L31/042H01L31/0264H01L31/18C23C16/513C23C16/455
CPCY02E10/52Y02E10/50Y02P70/50
Inventor 张建军张丽平倪牮曹宇王先宝赵颖耿新华
Owner NANKAI UNIV
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