Thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof
A technology of an array substrate and a manufacturing method, which is applied in the field of thin film transistor liquid crystal display manufacturing, can solve problems such as excessive TFT off-state current, affecting TFT performance, and shortening of pixel electrode charge retention time, so as to reduce off-state current and reduce R & D and production costs, the effect of extending the time for pixel electrode charge retention
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[0027] Such as figure 1 Shown is the flow chart of the TFT-LCD array substrate manufacturing method of the present invention, including:
[0028] Step 1, depositing a layer of gate metal thin film on the substrate, and forming the pattern of gate electrode and gate line through the first patterning process;
[0029] Step 2. Depositing a gate insulating film, a semiconductor film and a barrier film on the substrate completed in step 1, and forming a pattern of the semiconductor layer and the barrier layer through a second patterning process, the barrier layer is used to prevent the semiconductor layer from being etched;
[0030] Step 3. Deposit ohmic contact film, transparent conductive film, source-drain metal film and passivation film on the substrate after step 2, and form source electrode, drain electrode, channel, data line, pixel electrode and Graphics of the passivation layer.
[0031] The specific implementation process of each step is introduced in detail below.
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