Polishing agent for renewing polished tiles, stones and artificial stones

A technology of polishing agent and artificial stone, which is applied in the fields of polishing agent for artificial stone, polished tiles, and stone materials. It can solve the problems of dirty materials, unclean cleaning, and loss of luster, and achieve the effect of luxurious decoration and improved durability.

Inactive Publication Date: 2010-09-22
佛山市克里普斯科技有限公司
View PDF7 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after many years of trampling, these materials will become dirty, discolored, and even lose their original luster, which cannot be cleaned by general methods, let alone restore their original color and luster.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] The invention discloses a polishing agent for polishing bricks, stone materials, and artificial stone renovation. It is prepared by adding fluorine-containing additives, pH regulators and other additives to nano silicon dioxide. The pH regulator is sodium hydroxide, hydroxide One or more of potassium, ammonia water, organic ammonia, sulfuric acid, hydrochloric acid, and nitric acid; one or more of fluorine-containing octanoate, fluorocarbon surfactant, and fluorosilicate; other One or more of ethylene glycol, ethylene glycol monobutyl ether, and glycerin are used as additives; nano-silica can be made of 14-16nm acidic nano-silica, 20-25nm alkaline nano-silica one or both. In the present embodiment, the specific formula is as follows: the components (parts by weight) of the polishing agent include 46.3% of deionized water, 0.2% of sodium hydroxide, 20% of acidic nano silicon dioxide of 14-16nm, and 20% of acidic nano-silica of 20-25nm. 30% of silicon oxide, 1% of fluoro...

Embodiment 2

[0016] In the present embodiment, the components (parts by weight) of the polishing agent include 53.7% of deionized water, 0.3% of sulfuric acid, 40% of acidic nano silicon dioxide of 14-16nm, 2% of ethylene glycol, and 2% of ethylene glycol monobutyl ether. %, sodium fluorosilicate 2%, just mix and stir the above ingredients.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a polishing agent for renewing polished tiles, stones and artificial stones. The polishing agent is characterized by being composed of the following components in parts by weight: 45-55% of deionized water, 0.1-0.3% of pH regulator, 0.5-1.2% of fluorine-containing auxiliary agent, 40-51% of nano silicon dioxide and 1.5-5.4% of other auxiliary agents. The polishing agent of the invention not only can remove dirty substances on the surfaces of stone bodies, but also can rapidly recover the color and luster and greatly improve the durability of the polished stones, marbles, granites, the artificial stones and the like, thus enabling the polished stones, marbles, granites, the artificial stones and the like to be even more luxury and beautiful than new floor decorations.

Description

technical field [0001] The invention relates to the technical field of polishing agents, in particular to a polishing agent for polishing bricks, stone materials and artificial stones. Background technique [0002] At present, modern homes, shopping malls, hotels, office buildings, and entertainment places mostly use polished tiles, marble, granite, artificial stone, etc. as floor decorations, which are luxurious, durable, and easy to clean. However, after years of trampling, these materials will become dirty, discolored, and even lose their original luster, and cannot be cleaned by ordinary methods, let alone restore their original color and luster. Contents of the invention [0003] The purpose of the present invention is to provide a polishing agent for polishing bricks, stones, and artificial stones that can not only remove dirt on the surface of stones or bricks, restore the original color, but also improve gloss in order to solve the deficiencies in the prior art. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
Inventor 周文鹏张文斌
Owner 佛山市克里普斯科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products