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Frame-type variable capacitor and preparation method thereof

A variable capacitance, frame-type technology, applied to variable capacitors, capacitors that change capacitance mechanically, capacitors, etc., can solve the problem of not improving the Q value, variable capacitance ratio variable capacitors, and performance parameters that cannot meet the design Value, process difficulty and other issues, to achieve the effect of high yield and reliability, low cost, and simple preparation process

Active Publication Date: 2010-09-22
江苏智能微系统工业技术股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

International Business Machines Corporation patent ZL200510008190.2 proposes a multi-layer structure that increases the metal area of ​​the side wall. It has a flat plate-shaped fixed electrode and a comb-shaped movable electrode. It is a multi-layer structure and uses embedded elastic materials. The structure is complicated It is very difficult, the material stress mismatch will cause the structure to warp, the performance parameters cannot reach the design value, and there is no invention content on how to improve the Q value and the variable capacity ratio of the variable capacitor; the US JDS Uniface Company applied for patent 00803826.0 and proposed A parallel-plate variable capacitor with a bimorph member of bimorph structure, the structure is composed of low-resistance materials, such as high-temperature superconducting HTS or thick metal layers

Method used

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  • Frame-type variable capacitor and preparation method thereof
  • Frame-type variable capacitor and preparation method thereof
  • Frame-type variable capacitor and preparation method thereof

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Embodiment Construction

[0057] The process flow is as follows:

[0058] 1. The first photolithography, surface metallization peeling off;

[0059] 2. The second photolithography, deep reactive ion etching (Deep Reactive Ion Etch, DRIE) on the front to form the front structure;

[0060] 3. The front structure is protected by Polyimide, forming a front protection, and supporting the front structure has been formed;

[0061] 4. The third photolithography, deep groove DRIE on the back substrate layer, forming the back window structure;

[0062] 5. The back structure is etched by HF acid wet method to remove the oxide layer structure under the corresponding structure in the SOI sheet;

[0063] 6. Remove the front polyimide protective layer to release the structure;

[0064] 7. Use the shadow mask version of the shadow mask to complete the metal patterning of the corresponding position on the surface of the SOI sheet and prepare for electrical connection.

[0065] Due to the need to reduce the driving ...

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Abstract

The invention discloses a frame-type variable capacitor and a preparation method, which belong to the technical field of micro-electromechanical system MEMS devices. The frame-type variable capacitor is characterized by consisting of three-dimensional comb-tooth-shaped drive electrodes and a three-dimensional comb-tooth-shaped adjustable capacitor and having a bi-directionally movable structure. High-frequency or radio frequency signals can be introduced by elongated and bended cantilever girders on a frame structure of the frame-type variable capacitor, so the rangeability of capacitance is low, while an absolute value is great; and the high-frequency or radio frequency signals can be introduced through a frame on the frame structure of the frame-type variable capacitor, so the rangeability of the capacitance is high, while the absolute value is small. Preferable design parameters of the variable capacitor are disclosed, and correspondingly, the preparation method is disclosed. The preparation method has the advantages of not only finishing control over a capacitance value, but also effectively improving a quality factor Q of the capacitor and the rangeability of the capacitance.

Description

technical field [0001] The invention belongs to the scope of micro-mechanical electronic system (Micro Electro Mechanical System, MEMS) device and its preparation, especially relates to the device based on the existing MEMS manufacturing technology, has high Q value, high capacitance adjustable ratio, frame structure interfinger drive type A micro MEMS variable capacitor and a preparation method thereof. Background technique [0002] In recent years, due to the wide application prospects of MEMS in military and civilian fields including satellite communication, battlefield detection weapon navigation, automotive electronics, etc., the research on MEMS itself has been continuously developed. MEMS devices in the field of high-frequency or radio frequency RF have become one of the hot spots in the development of next-generation radio frequency devices due to their advantages over current traditional devices in terms of size, power consumption, reliability and price. Due to the...

Claims

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Application Information

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IPC IPC(8): H01G5/011H01G5/18
Inventor 阮勇尤政李滨张高飞王晓峰邢飞
Owner 江苏智能微系统工业技术股份有限公司
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