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Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device

A technology of resin composition and spacer, which is applied in the direction of nonlinear optics, photosensitive material processing, photoplate process of pattern surface, etc. It can solve the problems of insufficient production, insufficient curing reaction, and difficulty in obtaining the size and shape of the spacer, etc. question

Inactive Publication Date: 2010-10-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, although the production volume is increased, if the mercury lamp with high illuminance is used directly, the life of the reflector used in the exposure machine will be reduced. Therefore, a filter is often used to cut off short-wavelength radiation with high energy less than 350nm use
However, since most conventional radiation-sensitive polymerization initiators have a maximum absorption wavelength at less than 350 nm, if radiation with a wavelength of less than 350 nm is cut off, free radicals, etc. required for curing the radiation-sensitive resin composition cannot be sufficiently generated. Reactive species, insufficient curing reaction, making it difficult to obtain a satisfactory size and shape of the spacer
[0008] In addition, conventional radiation-sensitive polymerization initiators have poor liquid storage properties, so there is a problem that the handling properties of the coating liquid must be preserved by cooling, and the resulting impact on cost increases. issues such as temporal stability

Method used

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  • Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device
  • Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device
  • Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device

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Embodiment

[0290] Hereinafter, although an Example demonstrates this invention more concretely, unless the summary is exceeded, this invention is not limited to a following Example. In addition, unless otherwise specified, "%" and "part" are based on mass.

[0291] Synthesis of resin

[0292] As an example of (A) resin, the synthesis example of the compound P-4+St which added the structural unit derived from styrene to the said compound P-4 is shown below. However, the monomer ratio in Compound P-4 was changed from the monomer ratio shown above.

Synthetic example 1

[0294] 7.48 parts of 1-methoxy-2-propanol (trade name: MFG, manufactured by Nippon Emulsifier Co., Ltd.) was added to the reaction vessel in advance, and the temperature was raised to 90°C. 3.1 parts of styrene (St; w), tricyclopentenyl methacrylate (TCPD-M (trade name) manufactured by Hitachi Chemical Industry Co., Ltd.; x) 4.28 parts, methacrylic acid (MAA; y ) 11.7 parts, a mixed solution consisting of 2.08 parts of an azo polymerization initiator (manufactured by Wako Pure Chemical Industries, Ltd., V-601 (trade name)), and 55.2 parts of 1-methoxy-2-propanol. After the dropwise addition, it was reacted for 4 hours to obtain an acrylic resin solution.

[0295] Next, 0.15 parts of hydroquinone monomethyl ether and 0.34 parts of tetraethylammonium bromide were added to the above-mentioned acrylic resin solution, and then 26.4 parts of glycidyl methacrylate (GLM, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise over 2 hours. parts (GLM-MAA; z). After the...

Synthetic example 2

[0301] The synthesis of the above compound P-4 was carried out as follows. However, the monomer ratio in Compound P-4 was changed from the monomer ratio shown above.

[0302] Except that styrene was not used in Synthesis Example 1, the addition amounts of TCPD-M(x), methacrylic acid (y) and GLM-MAA(z) were changed so that x:y:z in Compound P-4 was 34mol%: 27mol%: 39mol%, synthesized by the same method as in Synthesis Example 1 to obtain a resin solution (solid content acid value: 72.5mgKOH / g) of compound P-4 ((A) resin) having an unsaturated group , Mw: 22,000, 1-methoxy-2-propanol / 1-methoxy-2-propyl acetate 45% solution).

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Abstract

Disclosed is a radiation-sensitive resin composition for spacers, which has high sensitivity and excellent storage stability. Also disclosed are a spacer formed by using such a radiation-sensitive resin composition, a method for forming such a spacer, and a liquid crystal display device comprising such a spacer. Specifically disclosed is a radiation-sensitive resin composition for forming spacers, which contains (A) a resin having, in a side chain, a branched structure and / or an alicyclic structure, an acidic group, and an ethylenically unsaturated group bonded to the main chain through an ester group, (B) a polymerizable unsaturated compound, and (C) a hexaarylbiimidazole compound (C1), an aromatic mercapto compound (C2) and an assistant (C3).

Description

technical field [0001] The present invention relates to a radiation-sensitive resin composition for forming a spacer, a spacer, a method for forming the spacer, and a liquid crystal display element. Background technique [0002] Conventionally, liquid crystal display devices have been widely used as display devices for displaying high-quality images. A liquid crystal display device generally includes a liquid crystal layer capable of displaying an image with a predetermined orientation between a pair of substrates. Maintaining the distance between the substrates uniformly, that is, the thickness of the liquid crystal layer is one of the factors that determine the image quality. Therefore, spacers are provided to keep the thickness of the liquid crystal layer constant. The thickness between the substrates is generally referred to as "cell thickness". The cell thickness generally means the thickness of the above-mentioned liquid crystal layer, in other words, means the dista...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/031C08F2/50C08F290/12G02F1/1339G03F7/033G03F7/40
CPCG03F7/0007G03F7/033C08F290/00C08F290/06G03F7/0388C08F290/12G02F1/13394G03F7/40G02F2202/023G03F7/031
Inventor 中村秀之望月乔平山崎健太福重裕一
Owner FUJIFILM CORP
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