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Method for controlling acquisition of alloy films on multi-arc ion plating machine and proportional regulator thereof

A proportional regulator and multi-arc ion technology, applied in ion implantation plating, sputtering plating, vacuum evaporation plating, etc., can solve the problems of target craters, insufficient quantification, and precision control. To achieve the effect of reducing the number of droplets

Inactive Publication Date: 2010-10-27
GUANGDONG UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is simple to make the target and the source of components is convenient, but due to the inconsistency of the melting point of the target surface mosaic, the arc spot burning speed and the evaporation amount are inconsistent, the target is easy to form "crater" or "forest" phenomenon, and the composition of the film and the design composition are also different. There will be large deviations, and sometimes it is not easy to control;
[0008] (3) Combined target material: install cathode targets of different components at different target positions in the vacuum chamber, and control the deposition power and parameters to obtain multi-component composite films, but the uniformity of the film composition is poor, and the component concentration is related to parameter control. Not enough repeatability;
The use of these targets and equipment in the preparation of multi-layer multilayer films is only carried out at the layer structure level, and the quantification is not enough, let alone precise control

Method used

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  • Method for controlling acquisition of alloy films on multi-arc ion plating machine and proportional regulator thereof
  • Method for controlling acquisition of alloy films on multi-arc ion plating machine and proportional regulator thereof
  • Method for controlling acquisition of alloy films on multi-arc ion plating machine and proportional regulator thereof

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Embodiment Construction

[0036] Working principle of the present invention is:

[0037] First, install different kinds of pure metal targets on two opposite cathode target positions of the multi-arc ion coating equipment;

[0038] Secondly, in front of one of the vacuum cathode targets, a proportional regulator to adjust the flow rate of the sub-sieve cathode plasma is installed. The proportional regulator is a double-layer circular baffle with ring holes, and the ring of the two baffles The holes are the same, and occupy a certain proportion of the entire circular baffle, and the centers of the two baffles are equipped with guide posts and guide sleeves that allow them to rotate with each other; the rotation angle of the double-layer circular baffle of the proportional regulator can be adjusted;

[0039] During operation, the flux of cathode plasma can be adjusted by adjusting the rotation angle of the two plates of the proportional regulator, thereby controlling the proportion of components in the pla...

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Abstract

The invention discloses a method for controlling acquisition of alloy films on a multi-arc ion plating machine and a proportional regulator thereof. The proportional regulator for regulating screening cathode plasma flux is arranged in front of one of vacuum cathode target boots; the proportional regulator is a double-layer circular baffle plate with annular holes, the annular holes of the two baffle plates are the same and account for a certain proportion of the whole circular baffle plate, and the centers of the two baffle plates are provided with a guide pillar and a guide bush for rotating the baffle plates mutually; and the rotating angle of the double-layer circular baffle plate of the proportional regulator can be regulated. The flux of cathode plasma is regulated by regulating the rotating angles of the two plates of the proportional regulator so as to control the proportion of components in the plasma atmosphere; and multi-element multilayer composite films are prepared by controlling the working state of a target. The method can effectively control the proportion of the components in the plasma atmosphere, and can prepare the multi-element multilayer composite films; and high-hardness ceramic multi-element films or multi-element multilayer films can be prepared by introducing N2 and CH4 during deposition.

Description

technical field [0001] The invention belongs to the field of surface treatment of alloy thin films by using a multi-arc ion coating machine. Background technique [0002] With the rapid development of modern science and technology, higher requirements are constantly put forward for the performance of materials. Material science is facing new challenges, and the main direction of its development will be to continue to develop new materials and give full play to the performance of existing materials. Wear, fatigue, and corrosion are the three main ways that lead to the failure of metal parts, and they are all closely related to the surface state (physical, chemical, and stress state, etc.) of the part material. The wear resistance and high temperature oxidation resistance of tools and molds mainly depend on the characteristics of the surface, and the fatigue cracks of most parts are initiated on the surface. Therefore, one of the keys to improving the performance of parts is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54
Inventor 谢光荣曾鹏胡社军
Owner GUANGDONG UNIV OF TECH
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