Preparation method of self-supporting colloid photon crystal film

A colloidal photonic crystal, self-supporting technology, applied to the device of coating liquid on the surface, special surface, pre-treated surface, etc.

Active Publication Date: 2011-01-05
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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  • Preparation method of self-supporting colloid photon crystal film

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Embodiment 1

[0036] Spin-coat the mixed solution containing polymerizable monomers (acrylamide 1wt%, ammonium persulfate 0.1wt%, N,N-methylenebisacrylamide 0.1wt%, water 98.8wt%) evenly on the glass at a speed of 500rpm The elastic hydrogel substrate was obtained by thermal cross-linking polymerization at 60°C for 1 hour. The mixture aqueous solution (acrylamide 1wt%, ammonium persulfate 0.1wt%, N, N-methylenebisacrylamide 0.1wt%) of the mixture aqueous solution of monodisperse latex particle and monomer, particle diameter is the monodisperse polystyrene latex particle of 100nm 40wt%, water 58.8wt%) evenly drop-coated on the above-mentioned elastic hydrogel substrate; after placing the obtained sample at 90 ℃ and the relative air humidity of 60RH% for 5 hours, a self-supporting colloidal photonic crystal was obtained membrane.

Embodiment 2

[0038] The mixed solution containing polymerizable monomers (acrylic acid 40wt%, potassium persulfate 5wt%, N, N-methylenebisacrylamide 5wt%, water 50wt%) was uniformly spin-coated on a silicon wafer at a speed of 2000rpm, and then Thermal cross-linking polymerization at 70°C for 1 hour to obtain an elastic hydrogel substrate. The mixture aqueous solution (20wt% of acrylic acid, 5wt% of potassium persulfate, 5wt% of N, N-methylenebisacrylamide, 0.5wt% of monodisperse silica latex particles with a particle size of 300nm) , water 69.5wt%) evenly drop-coated on the above-mentioned elastic hydrogel substrate; after placing the obtained sample at 60° C. and the relative air humidity of 30RH% for 2 hours, a self-supporting colloidal photonic crystal film was obtained.

Embodiment 3

[0040] Evenly drop-coat the mixed solution containing polymerizable monomers (20wt% methacrylic acid, 2wt% hydrogen peroxide, 2wt% N, N-methylenebisacrylamide, 76wt% water) on a stainless steel sheet, heat it at 30°C The cross-linking polymerization was carried out for 3 hours to obtain an elastic hydrogel substrate. Then the mixture aqueous solution of monodisperse latex particle and monomer (methacrylic acid 10wt%, hydrogen peroxide 3wt%, N, N-methylenebisacrylamide 3wt%, particle diameter is the monodisperse poly(styrene- Methyl methacrylate-acrylic acid) latex particle 20wt%, water 64wt%) uniform roller coating on the above-mentioned elastic hydrogel substrate; Gained sample is placed 12 hours under the condition of 30 ℃ and relative air humidity of 90RH% Finally, a self-supporting colloidal photonic crystal film is obtained.

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Abstract

The invention belongs to the technical field of preparation and application of colloid photon crystals and in particular relates to a method for preparing the self-supporting colloid photon crystal with a large area through a co-crosslinking self-assembling method. The preparation method comprises the following steps of: mixing an aqueous emulsion with monodisperse emulsion particles in a certain concentration, a polymerizable monomer, an initiator and a crosslinking agent according to a certain ratio by taking an elastic material as a self-assembling substrate, dispensing a mixture or roller painting the mixture on an elastic hydrogel substrate for co-crosslinking self-assembling, polymerizing the polymerizable monomer and the crosslinking agent in the gap among monodisperse emulsion particles in the self-assembling process, evaporating water and then drying to form a self-supporting three-dimensional colloid photon crystal film periodically arranged. The self-supporting colloid photon crystal has favorable optical performance and potential application prospects in the aspects of optical element, integrated optical circuit, sensor, and the like.

Description

technical field [0001] The invention belongs to the technical field of preparation and application of colloidal photonic crystals, and in particular relates to a method for preparing large-area, self-supporting colloidal photonic crystals through a co-crosslinking self-assembly method. Background technique [0002] Since the concept of photonic crystals was proposed in 1987, photonic crystals have very important applications in optical devices, sensor devices and catalytic systems due to their special light-regulating properties. Therefore, the preparation and application of photonic crystal materials have attracted much attention. The preparation of high-quality and large-area photonic crystals has always been a very critical factor affecting the application of photonic crystals. At present, there are two main methods for the preparation of photonic crystals: one is the top-down microfabrication method, which is complicated in process and high in cost, and it is difficult t...

Claims

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Application Information

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IPC IPC(8): B05D5/06B05D7/04B05D1/38B05D3/06B05D3/02C08J7/04C03C17/28C04B41/48C04B41/83
Inventor 李志荣王京霞黄羽宋延林
Owner INST OF CHEM CHINESE ACAD OF SCI
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