Photodiode n region structure optimized mercury-cadmium-tellurium (HgCdTe) long-wavelength detection chip
A photodiode and chip technology, applied in circuits, electrical components, semiconductor devices, etc., can solve problems such as photodiode dynamic impedance and detection performance degradation, and achieve suppression of defect-assisted tunneling current, reduction of density, and optimization of energy band structure Effect
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[0013] The ion implantation n optimized with the photodiode n region structure + -on-p Hg 1-x Cd x Te (x=0.221) infrared long-wave photovoltaic detection chip is an embodiment, and in conjunction with the accompanying drawings the specific implementation of the present invention is described in further detail:
[0014] See figure 1 , the optimized n-region structure of the photodiode of the present invention is n + -on-p-type HgCdTe infrared long-wave photovoltaic detection chip includes: infrared substrate 1, p-type active region 2 of photosensitive element, n-type region 3 of photosensitive element, common electrode 4 on the surface of p-type region, n-type region The photosensitive element electrode 5 on the surface, the passivation dielectric film 6 of the detection chip and the indium column array 7 mixed and interconnected with the readout circuit. The array of n-type regions 3 of the photosensitive element and the p-type active region 2 of the photosensitive element...
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