Method of dielectric film treatment
A technology of dielectric film and dielectric material, applied in circuits, electrical components, semiconductor/solid-state device manufacturing, etc., can solve problems such as metal passivation, electrical integrity impact, etc.
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[0021] Some embodiments for cleaning the surface of the substrate better and more efficiently will now be described. However, it is obvious to those skilled in the art that the present invention can still be implemented without some or all of these specific details. In other cases, well-known processing operations are not described in detail so as not to unnecessarily obscure the present invention.
[0022] Traditional methods have focused on providing solutions that remove certain types of contaminants from the surface of the substrate. It is well known in the industry that there is more than one type of contaminant that may cause damage to the surface of the substrate. figure 1 A simplified schematic diagram of the damaged portion 100-5 of the substrate 100 with multiple contaminants is depicted. As shown in the figure, the portion 100-5 of the substrate 100 includes a low-k dielectric film layer 110 formed on the substrate 100. The low-k dielectric film layer 110 is formed u...
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