High-resolution aspheric photoetching object lens
A lithography objective lens and high-resolution technology, applied in the field of high-resolution projection lithography objective lenses, can solve the problems of large total thickness and weight of the deep ultraviolet lithography objective lens, simplify the objective lens manufacturing process, improve the quality of the objective lens, and improve the imaging quality effect
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[0028] In order to better illustrate the purpose and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0029] The high-resolution aspheric lithography objective lens of this embodiment is composed of front and rear lens groups, and a total of 29 spherical lenses are used, including three 10-degree aspheric surfaces. as attached figure 1 As shown, lenses 1 to 20 are the front lens group, lenses 21 to 29 are the rear lens group, and 30 is the image plane, that is, the surface where the silicon chip is located. The lens material uses fused silica (refractive index of 1.560326 at the system center wavelength of 193.368nm) as the main lens material, and calcium fluoride (refractive index of 1.501455 at the system center wavelength) as the material used to correct chromatic aberration.
[0030] The front lens group includes a first meniscus lens 1, a first negative len...
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