Vacuum magnetron sputtering color plating equipment
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A vacuum magnetron sputtering and vacuum coating technology, which is applied in sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve the problems of uneven coating, improve the quality of film formation, improve the technical level and The effect of technological level and small footprint
Active Publication Date: 2011-03-23
沈阳科友真空技术有限公司
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[0003] In order to solve the above-mentioned uneven coating problem, the purpose of the present invention is to provide a large-scale vacuum magnetron sputtering with high efficiency, high flexibility, mass production and small footprint using the principle of inclined target compensation and multifunctional sample suspension Color plating equipment
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[0019] The invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0020] Such as figure 1 As shown, the baking chamber 3, the workpiece pre-suspension platform 7, and the vacuum coating chamber 17 are sequentially arranged in the working space, the sample suspension frame 8 is arranged above the workpiece pre-suspension platform 7, and the sample suspension frame pallet 5 and the sample suspension frame are above the transfer vehicle 4. Its trolley track 6 is also equipped with a trolley track 6 above the workpiece pre-suspension table 7, at the corresponding positions of the baking chamber 3 and the indoor bottom of the vacuum coating chamber 17, and the vacuum coating chamber 17 is equipped with multiple groups of columnar rotating magnetron targets. 16. Compensation inclined target 15 and cathode ion source 12. There is a bearing assembly 21 docked with the sample suspension frame 8 in the upper and lower centers of the ro...
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Abstract
The invention discloses vacuum magnetron sputtering color plating equipment. In order to remove a shadow region of a complex-shaped product during film formation and improve the surface film forming uniformity of the product, on one hand, the revolution and rotation of a workpiece are finished by a suspension rod with a planetary gear structure; and on the other hand, symmetrical compensating inclined targets are arranged between columnar magnetron targets on upper and lower sides of a sample suspending rack (8). Because the sample rack loads bias pressure, a magnetron target filming material can be deposited on a product substrate in multiple directions. By combining the multifunctional sample suspending rack and the compensating inclined targets, a film-coating dead angle can be effectively removed, the film forming quality is improved, and the complex-shaped product substrate can be plated.
Description
technical field [0001] The invention belongs to the field of physical vapor deposition, and relates to a vacuum magnetron sputtering coating equipment. Background technique [0002] In the production of photoelectric thin films, thin films for semiconductor electronics, surface decoration and other industries, vacuum magnetron sputtering technology is used to plate metals, alloy semiconductors, or metal compounds on the surface of plastic materials, metal material product samples or optical glass. Thin film to meet some special needs, such as decoration, conduction, improving hardness and strength, etc. Among them, for the batch coating in the decoration industry, the rotating column type magnetron sputtering target structure proposed by the US Patent No. 5,096,562 in 1992 is widely used. However, in the actual production process, for irregular-shaped product substrates, such as mobile phone casings, watch casings, cosmetic covers, auto parts, etc., especially with the rapi...
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