Culture technique for corn

A technology of corn cultivation and technology, applied in the field of crop cultivation, can solve the problems of poor quality, waste of seeds, low yield, etc., and achieve the effects of promoting seedling growth, excellent sowing mode, and obvious effect of increasing production

Inactive Publication Date: 2011-05-04
宋晓东
View PDF0 Cites 28 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a kind of corn cultivation technology to solve the problems of existing corn cultivation technology such as wasting seeds, low yield and poor quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The following examples are taken to illustrate this cultivation technique.

[0026] The test site is Beibei District, Chongqing, with an area of ​​5 hectares, and the time is 2004 and 2005.

[0027] (1) Seed selection: select Zhengdan hybrid seeds.

[0028] (2) Seed drying: Spread the selected seeds on the mat or a thin layer on the ground, and turn them in the sun for 2 days continuously.

[0029] (3) Seed coating: it is preferred to coat the seeds with "Suibuhei" (8.1% ketopentazole suspension seed coating agent).

[0030] (4) Fertilization: Increase the application of organic fertilizer, combined with the application of 30 cubic meters of agricultural fertilizer per hectare in the old furrows for site preparation, and 380 kg of ternary compound fertilizer per hectare. Fertilizers were applied at a depth of more than 10 cm below the seed layer.

[0031] (5) Topdressing: Combine shoveling and topdressing with urea when the 6 leaves are unfolded and at the trumpet st...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a culture technique for corn. The culture technique mainly comprises (1) seed selection, (2) seed drying, (3) seed coating, (4) fertilization, (5) topdressing, (6) sowing, (7) chemical weeding, (8) field management, (9) chemical control, (10) prevention and control of plant diseases and insect pests, and (11) harvesting at suitable time. The corn culture technique has main characteristics of good seed selection, seed coating and excellent sowing mode. The technique effectively solves the problems of seed waste, low yield, poor quality and the like of the conventional corn culture technology, can make full use of space, can ventilate and transmit light, and can stimulate the plants to fully absorb underground moisture and nutrients; and the root systems of the plants are crossed so as to enhance the lodging resistance and achieve good quality and high yield.

Description

technical field [0001] The invention relates to a crop cultivation method, in particular to a corn cultivation technique. Background technique [0002] At present, in the well-known corn cultivation technology, there are mainly the following defects: 1. Single hole and single plant colonization after sowing and seedling cultivation, generally 4 seeds are kept for one seedling, which wastes seeds; 2. Water and fertilizer management, disease and insect pest control lack cultivation Mode, resulting in low corn pollination rate, poor lodging resistance, low yield, poor quality; 3, low planting density, low land utilization. Contents of the invention [0003] The purpose of the invention is to provide a kind of corn cultivation technology to solve the existing problems of corn cultivation technology such as waste of seeds, low yield and poor quality. [0004] For realizing above object, technical scheme of the present invention is to provide a kind of corn cultivation technolo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A01G1/00A01C1/00A01C1/06A01M21/04A01G13/00A01G7/06
Inventor 宋晓东
Owner 宋晓东
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap