Anodic aluminum oxide template with three-dimensional gradual-changed hole array nanostructure and preparation method of anodic aluminum oxide template

A technology of anodized aluminum and nanostructures, applied in electrolytic coatings, surface reaction electrolytic coatings, coatings, etc., can solve the problems of difficult effective regulation and high cost, and achieve the effect of reducing template preparation time

Inactive Publication Date: 2011-05-04
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Furthermore, even if these technologies make breakthroughs in the future and can realize the preparation of three-dimensional porous templates, they still have disa

Method used

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  • Anodic aluminum oxide template with three-dimensional gradual-changed hole array nanostructure and preparation method of anodic aluminum oxide template
  • Anodic aluminum oxide template with three-dimensional gradual-changed hole array nanostructure and preparation method of anodic aluminum oxide template
  • Anodic aluminum oxide template with three-dimensional gradual-changed hole array nanostructure and preparation method of anodic aluminum oxide template

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Experimental program
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Effect test

Embodiment 1

[0047] Embodiment 1 The preparation process of the three-dimensional graded hole array nanostructured anodic aluminum template is as follows:

[0048] Using sulfuric acid solution as electrolyte, sulfuric acid concentration is 0.01M~10M, aluminum sheet is oxidized with high intensity under the voltage of 10V~100V (current density>30mA / cm 2 ). After the oxide layer is stripped off, a regularly arranged pit structure is produced on the surface of the aluminum sheet. The period (pitch, the same below) of the pits is 50 nm to 200 nm. The aluminum sheet with the pit structure is subjected to cyclic oxidation and hole expansion, and the number of cycles is 3 to 20 times. The oxidation conditions are in acidic electrolyte, such as in 0.1vol%~10vol% phosphoric acid solution, the oxidation voltage is 35V~200V, and the oxidation is carried out, and the single oxidation time is 0min~60min, and the time of each oxidation is the same. The hole expansion condition is to perform hole expa...

Embodiment 2

[0049] Embodiment 2 The preparation process of the three-dimensional graded hole array nanostructured anodic aluminum template is:

[0050] The sulfuric acid-oxalic acid mixed solution is used as the electrolyte, the sulfuric acid concentration is 0.0001M~10M, the oxalic acid concentration is 0.001M~5M, and the aluminum sheet is subjected to high-intensity oxidation under the voltage of 15V~150V (current density> 30mA / cm 2 ). After the oxide layer is stripped off, a regularly arranged pit structure is produced on the surface of the aluminum sheet. The period of the pits is 60 nm to 350 nm. The aluminum sheet with the pit structure is subjected to cyclic oxidation and hole expansion, and the number of cycles is 3 to 20 times. The oxidation conditions are in acidic electrolyte, such as in 0.001M ~ 5M oxalic acid solution, the oxidation voltage is 25V ~ 300V, and the oxidation is carried out. The single oxidation time is 0min ~ 60min, and the time of each oxidation is the same ...

Embodiment 3

[0051] Embodiment 3 The preparation process of the three-dimensional graded hole array nanostructured anodic aluminum template is as follows:

[0052] The oxalic acid solution is used as the electrolyte, the oxalic acid concentration is 0.01M-1M, and the aluminum sheet is subjected to high-intensity (current density> 30mA / cm) under the voltage of 15V-200V. 2 ) oxidation. After the oxide layer is stripped off, a regularly arranged pit structure is produced on the surface of the aluminum sheet. The period of the pits is 150 nm to 380 nm. The aluminum sheet with the pit structure is subjected to cyclic oxidation and hole expansion, and the number of cycles is 3 to 20 times. , For example, in the mixed solution of oxalic acid and sulfuric acid, the concentration of sulfuric acid is 0.0001M~10M, the concentration of oxalic acid is 0.001M~5M, the oxidation voltage is 45V~400V, and the oxidation is carried out, and the oxidation time is 0min~450min each time, and the single oxidati...

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Abstract

The invention discloses an anodic aluminum oxide template with three-dimensional gradual-changed hole array nanostructure and a preparation method of the anodic aluminum oxide template. The preparation method comprises the following steps: carrying out high-strength oxidation process on an aluminum sheet in the acidic electrolyte to form a porous aluminum oxide layer, then removing the porous aluminum oxide layer and forming nanometer concave pattern on the surface of the aluminum sheet; oxidizing the aluminum sheet in the acidic electrolyte again to perform hole expanding process in the acidic electrolyte; and repeating the processes, adjusting at least one condition in the electrolyte composition, the oxidation voltage, the oxidation time and the hole expanding time, and circulation times to obtain the target product. By using the preparation method in the invention, the industrialized and quick production of the three-dimensional gradual-changed hole array nanostructure with low cost is realized, and the size of the basic construction unit of the product prepared is diminished continuously or discontinuously from top to bottom. The central axis of the product is vertical to the base plane, the hole pitch can be adjusted in the range of 50 nm to 1200 nm, and the profile of hole channel can be regulated accurately. The invention has a wide application prospect in the development of various functional nanomaterials.

Description

technical field [0001] The invention relates to a material with a three-dimensional gradient hole array nanostructure and a manufacturing method thereof, in particular to a low-cost preparation of a three-dimensional gradient hole array nanostructure anodic aluminum template by using electrochemical self-organization nanotechnology and a preparation method thereof. Background technique [0002] In recent years, with the deepening of nanotechnology research, the three-dimensional nanograded body array structure has shown excellent performance in many fields such as optoelectronics due to its superhydrophobicity, antireflection, surface Raman enhancement effect and other characteristics, but its low cost Large-area controllable manufacturing is still difficult. Although traditional top-down nanofabrication techniques, such as reactive ion beam etching, plasma beam etching, lithography, etc., can realize the preparation of three-dimensional nano graded protrusion structures on ...

Claims

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Application Information

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IPC IPC(8): C25D11/12
Inventor 高雪峰李娟李丛姗朱杰
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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