Method for recovering oxalate and acid liquor from acidic etching waste liquor

A technology of acidic etching waste liquid and oxalate, which is applied in the field of recycling oxalate and acid liquid, can solve the problems of mountains and rivers and soil environmental pollution, and achieve the effect of eliminating procedures and costs

Inactive Publication Date: 2011-05-25
苏州超联光电有限公司
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, in the production process of all printed circuit boards, depending on the type of etchant used, various acidic copper-containing or acidic nickel-containing etching waste solutions will be discharged, such as: waste copper sulfate aqueous solution, waste copper nitrate aqueous solution, Waste copper chloride aqueous solution, nickel sulfa

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for recovering oxalate and acid liquor from acidic etching waste liquor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] When the acidic etching waste liquid is a copper sulfate solution, oxalic acid is added to the copper sulfate solution to react to form a copper oxalate precipitate and a sulfuric acid solution. The chemical reaction formula is as follows:

[0016] CuSO 4 +H 2 C 2 o 4 →CuC 2 o 4 ↓+H 2 SO 4

[0017] The copper oxalate precipitate is separated from the acidic etching waste liquid by filtration or precipitation clarification to obtain solid copper oxalate. The copper sulfate waste liquid after extracting the copper ion components becomes a sulfuric acid solution with a higher concentration, which can be used as the raw material of the acid etchant in combination with the new liquid.

Embodiment 2

[0019] When the acidic etching waste liquid is a copper chloride solution, oxalic acid is added to the copper chloride solution to react to form a copper oxalate precipitate and a hydrochloric acid solution. The chemical reaction formula is as follows:

[0020] CuCl 2 +H 2 C 2 o 4 →CuC 2 o 4 ↓+2HCL

[0021] The copper oxalate precipitate is separated from the acid waste liquid by filtration or precipitation clarification to obtain solid copper oxalate. The waste copper chloride solution after extracting the copper ion components becomes a hydrochloric acid solution with a higher concentration, which can be used as a raw material for an acid etchant in conjunction with the new solution.

Embodiment 3

[0023] When the acidic etching waste liquid is a ferric chloride solution, oxalic acid is added to the ferric chloride solution, and the reaction forms a copper oxalate precipitate and contains iron ions (Fe 2+ ) and chloride ion Cl - Hydrochloric acid solution, its chemical reaction formula is as follows:

[0024] CuCl 2 +FeCl 3 +H 2 C 2 o 4 →CuC 2 o 4 ↓+Fe 2+ +3Cl - +2HCL

[0025] The copper oxalate precipitate is separated from the acidic etching waste liquid by filtration or precipitation clarification to obtain solid copper oxalate. The ferric chloride waste liquid after the copper ion component is extracted becomes acidity concentration higher and contains iron ion (Fe 2+ ) and chloride ion Cl - The hydrochloric acid solution can be used with the new solution as the raw material of the acid etchant.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for recovering oxalate and acid liquor from acidic etching waste liquor. The method comprises the following steps of: mixing a proper amount of oxalic acid and the acidic etching waste liquor; performing hydrolysis reaction to form oxalic acid radicals; combining the oxalic acid radicals and bivalent metal ions in the acidic etching waste liquor to form water-insoluble oxalate precipitates; and separating the oxalate precipitates out from the acidic etching waste liquor by a filter method or a precipitate clarification method and the like to obtain solid-state oxalate, wherein the acidic etching waste liquor from which the metal ions are extracted becomes the acidic liquor with higher concentration and can be used for preparing etching liquor or can be used as a raw material for other industries. By the method, the cost of raw materials is greatly reduced, and a reprocessing procedure and the expenditure cost are saved; and the method has great significance to energy conservation and effective pollution prevention.

Description

technical field [0001] The invention relates to a method for reclaiming oxalate and acid solution from acidic etching waste liquid, in particular to a method for reclaiming oxalate and acid solution from acidic etching waste liquid discharged in the production of printed circuit boards (PCB) . Background technique [0002] At present, in the production process of all printed circuit boards, depending on the type of etchant used, various acidic copper-containing or acidic nickel-containing etching waste liquids will be discharged, such as: waste copper sulfate aqueous solution, waste copper nitrate aqueous solution, Waste copper chloride aqueous solution, nickel sulfate aqueous solution, nickel nitrate aqueous solution or waste ferric chloride, iron oxide aqueous solution, if the copper ions or nickel ions in these acidic copper-containing or acidic nickel-containing etching waste liquids are not collected after treatment, they will be discharged. It will cause serious pollu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C07C55/07C07C51/41C02F1/62C02F101/20
Inventor 伊藤正树
Owner 苏州超联光电有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap