Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Radio frequency silicon-on-insulator complementary metal oxide semiconductor low-noise amplifier

An oxide semiconductor, low noise amplifier technology, applied in the direction of improving amplifiers to increase efficiency, improving amplifiers to reduce noise effects, etc., can solve problems such as loss, impedance mismatch, bandwidth reduction, etc. The effect of strong protection ability and low power consumption

Inactive Publication Date: 2011-06-01
EAST CHINA NORMAL UNIV
View PDF3 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

High-frequency radio frequency circuits are highly sensitive to parasitic effects and traditional ESD protection methods. When high-frequency radio frequency circuits are applied to radio frequency devices, impedance mismatch or loss may result, resulting in signal reflection, gain reduction, bandwidth reduction, and noise figure increase. Large, etc., so the performance of low-noise amplifiers made by traditional silicon processes will not be very good

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radio frequency silicon-on-insulator complementary metal oxide semiconductor low-noise amplifier
  • Radio frequency silicon-on-insulator complementary metal oxide semiconductor low-noise amplifier
  • Radio frequency silicon-on-insulator complementary metal oxide semiconductor low-noise amplifier

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The technical solution of the present invention is a specific embodiment, and the embodiment will not be repeated here. The main structure of the technical solution of the present invention is introduced below. Diodes D1, D2, D3, D4 and bipolar transistors Q1, Q2 form a voltage clamping system (powerclamp), which plays a good role in electrostatic protection for the entire circuit. The clamping diodes D5 and D6 at the input end and the clamping diodes D7 and D8 at the output end also play a good role in protecting the input and output signals. The present invention adopts a cascode structure with source inductance negative feedback. At a center frequency of 2.4G, the input and output ends are matched to 50 ohms; the input impedance is determined by the following formula

[0021] Z in = jw ( Lg + Ls ) + 1 jw ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a partially-depleted silicon-on-insulator complementary metal oxide semiconductor process full chip integration-based low-noise amplifier which works at center frequency of 2.4GHz and has electrostatic protection. The amplifier has a cascode structure with source negative feedback; a clamp diode and a voltage clamp system in a circuit exert a good electrostatic protection effect; and when the low-noise amplifier works normally, the power gain is 13 decibels, the noise coefficient is 2.6 decibels, and the input echo loss is 13 decibels when the power consumption is 6.5 milliwatts. The amplifier has an electrostatic protection level which reaches 0.8 to 0.9 ampere, and the pulse current of a transmission line is 1.4 amperes. The low-noise amplifier has the advantages of low power consumption, high electrostatic protection capacity and good matching of noise, gain and input / output.

Description

technical field [0001] The invention relates to the technical field of radio frequency integrated circuit design, in particular to a full-chip integration of a partially depleted silicon-on-insulator (SOI) complementary metal-oxide-semiconductor (CMOS) with a central frequency of 2.4 GHz and an electrostatic protected low noise amplifier. Background technique [0002] With the rapid development of national electronic technology and the huge demand for low-cost high-speed mixed-signal integrated systems, people are trying to transfer several high-frequency basic circuit modules from GaAs to CMOS silicon technology. In the past decade, in order to improve the performance of devices such as cut-off frequency, the channel length of metal-oxide-semiconductor (MOS) tubes has shrunk to the deep submicron level. [0003] Due to the large junction capacitance and large on-current of devices made by traditional silicon technology, the cut-off frequency is low and the power consumptio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H03F1/02H03F1/26
Inventor 严琼陈磊赖宗声石春琦张书霖华林苏杰张伟刘盛富阮颖
Owner EAST CHINA NORMAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products