Method for adjusting real-time monitor device in exposure path of concave holographic grating
A holographic grating and real-time monitoring technology, which is applied in photoplate-making process exposure devices, microlithography exposure equipment, diffraction gratings, etc. The effect of misalignment of light, improving the production level
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[0011] The present invention is implemented according to the three method steps of step 1, step 2 and step 3 established in the technical solution to be solved. Among them, the light source laser 1 adopts Kr + Laser, the emission wavelength is 413.1nm; the first plane mirror 2, the second plane mirror 4 and the third plane mirror 5 are glass substrate aluminized mirrors; the beam splitter 3 adopts double glued glass prisms; the first spatial filter 6 and the second spatial filter 7 are composed of a microscope objective lens and a pinhole; the grating substrate 9 and the holographic grating 10 are made of K9 optical glass, and the photoresist coated on the K9 optical glass is Japan Shipley 1805 positive photoresist The receiving screen 11 is made of white frosted glass; the monitoring laser 12 is a He-Ne laser with an output wavelength of 632.8 nm; the photodetector 13 is a photomultiplier tube.
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