Method for adjusting real-time monitor device in exposure path of concave holographic grating

A holographic grating and real-time monitoring technology, which is applied in photoplate-making process exposure devices, microlithography exposure equipment, diffraction gratings, etc. The effect of misalignment of light, improving the production level
CN102087481AInactive Publication Date: 2011-06-08CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Publication Date
2011-06-08
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention belongs to the field of spectrum technology, and relates to a method for adjusting a real-time monitor device in the exposure path of a concave holographic grating. According to the technical scheme, the method comprises the following steps: (1) establishing a set of concave holographic grating exposure device; (2) resetting the holographic grating in the concave holographic grating exposure device to a position on which the original grating substrate is placed, and adjusting the position of the holographic grating to a position of the grating substrate by an optical interference method; and (3) irradiating the holographic grating with a monitoring beam emitted by a He-Ne laser, and placing a photoelectrical detector on the emergent light axis direction of the diffracted beam of the He-Ne laser. The method can accurately adjust the real-time monitor device in the exposure path of the concave holographic grating, and has the important value for improving the concave holographic grating fabrication technique.
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Description

technical field

[0001] The invention belongs to the adjustment method of a real-time monitoring device used in the exposure light path of a concave holographic grating related to the field of spectrum technology. Background technique

[0002] In the production process of the concave holographic grating, the appropriate exposure amount of the photoresist coated on the grating substrate directly determines whether the concave holographic grating with ideal grating groove shape can be produced. The most effective way to control the exposure is to use a real-time monitoring device to monitor the diffraction efficiency of the latent image grating in the photoresist in real time during the exposure process, and irradiate a beam of He-Ne laser that is not sensitive to the photoresist On the grating substrate, the photodetection device is used to record the time-varying curve of the intensity of the diffracted light of the monitoring beam, and the appropriate stop time of exposure c...

Claims

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