Method and system for manufacturing component by using shadow mask technological line
A production line and technical technology, applied in semiconductor/solid-state device manufacturing, electrical components, ion implantation plating, etc., can solve problems such as inability to manufacture microelectronic components
Inactive Publication Date: 2011-07-13
潘重光
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Abstract
The invention discloses a method and a system for manufacturing a component by using a shadow mask technological line. The method comprises the following steps: A. firstly depositing materials in a vacuum deposition box, and then accurately locating shadow mask plates in a first area of a substrate according to the operable relationship between the shadow mask plates and deposited material sources which are fully positioned in the vacuum deposition box; B. depositing the materials on the first area of the substrate through vacuum evaporation to form a graph; C. accurately locating the shadow mask plates and the deposited material sources in a second area of the substrate by a transmission device; and D. depositing the materials on the second area of the substrate through vacuum evaporation to form a graph and stereoscopic overlap of the materials; repeating step C and D according to design so as to complete composition and connection of the component; and sequentially annealing, testing, cutting and assembling respectively by a vacuum annealing box, a vacuum test box, a vacuum cutting box and a vacuum assembling box, and finally forming the complete component.
Application Domain
Vacuum evaporation coatingSputtering coating +2
Technology Topic
EngineeringVacuum deposition +4
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