Method and system for manufacturing component by using shadow mask technological line

[0036] In order to further explain the technical solution of the present invention, the present invention will be described in detail below through specific examples.

[0037] like figure 1 As shown, what it shows is a method for manufacturing devices using a shadow mask technology production line of the present invention, which includes the following steps:

[0038] A. accurately positioning the shadow mask on the first region of the substrate in operable relationship to the shadow mask and the source of deposition material positioned entirely within the deposition chamber;

[0039] B. Depositing the material on the first region of the substrate by vacuum evaporation to form a pattern;

[0040] C. Accurately position the shadow mask and the deposition material source in the basic second area through the transmission device; specifically, it can choose the way of moving the substrate or the way of moving the shadow mask to realize the positioning of the second area; When the substrate moving method is selected, the deposition vacuum box includes multiple sets arranged continuously, and the transmission device pushes the substrate to move along the deposition vacuum box so that the shadow mask and the deposition area on the substrate are accurately positioned; when the shadow mask moving method is selected , the deposition vacuum box only needs to be set to one, and the transmission device pushes the shadow mask and the deposition material source to move in the deposition vacuum box to accurately position the shadow mask and the deposition area on the substrate;

[0041] D. Deposit the material on the second area of ​​the substrate by vacuum evaporation to form a pattern and form a three-dimensional overlap between the materials; the stitching effect of the substrate can be realized by overlapping;

[0042] E. According to the design, repeat steps C and D to complete the composition and connection of components; by dividing the substrate into multiple regions, the effect of forming a large-area bottom plate from a small-area shadow mask can be realized, as one of them For the implementation method, you can refer to the expression in the Chinese patent announcement CN101027424B, which will not be elaborated here; of course, the way to realize the small-area shadow mask to form a large-area bottom plate is not limited to the above-mentioned patent announcement, for example: it can choose the method of dividing the deposition area , that is, the first area and the second area are divided into a plurality of small blocks, and by setting a set of shadow masks in each deposition vacuum box, and each set of shadow masks includes a plurality of shadow masks, and a Each of the shadow masks in the set of shadow masks corresponds to a small area in different areas, so that forming the entire substrate is achieved through separate deposition of different deposition vacuum boxes to achieve superimposition and deposition of the entire substrate; wherein, preferably , each shadow mask plate also includes a step of thoroughly cleaning the shadow mask plate after the evaporation is completed;

[0043] F. Push the substrate into the annealing vacuum box for annealing treatment; specifically, by controlling the temperature, it eliminates the stress generated in the deposition event, stabilizes the size, reduces the tendency of deformation and cracks; and plays a role in refining grains, adjusting Efficacy of organization and elimination of tissue defects;