Flat line type ion trap mass analyzer based on MEMS (micro electro mechanical system) process and manufacturing method thereof

A technology of a mass analyzer and a manufacturing method, which is applied in the field of ion trap mass spectrometers, can solve the problems of low processing accuracy, limited processing and assembly accuracy, and difficulty in batch production, so as to facilitate batch processing, reduce assembly errors, Effect of reducing ion loss

Inactive Publication Date: 2011-08-24
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Since the above-mentioned PLITMA is based on a PCB board or a metal plate, the processing and assembly precision is limited, so the yield rate of the production is not high, and it is difficult to mass p

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  • Flat line type ion trap mass analyzer based on MEMS (micro electro mechanical system) process and manufacturing method thereof
  • Flat line type ion trap mass analyzer based on MEMS (micro electro mechanical system) process and manufacturing method thereof
  • Flat line type ion trap mass analyzer based on MEMS (micro electro mechanical system) process and manufacturing method thereof

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[0030] See figure 1 , 2 , A flat linear ion trap mass analyzer based on MEMS technology, including upper and lower substrates 12, and support beams supporting the upper and lower substrates 12. On the substrate 12, three pairs of upper and lower corresponding parallel to each other are sputtered in sequence The ion lens focusing electrodes 5, 4, 3, the front gate electrode 6, the main radio frequency electrode 10, the auxiliary radio frequency electrode 2, 9, the rear gate electrode 11, the ion outlet repelling electrodes 1, 7, pre-calibrated on the upper and lower substrates 12 A through hole is opened at the position as the ion outlet 13, and the bonding area 8 and 14 of the support beam and the borosilicate glass substrate; the support beam is made by cutting a silicon wafer 16 with a custom thickness to a predetermined size, or combining two pieces The silicon wafer 18 and the borosilicate glass 19 of conventional thickness are cut to a predetermined size and then electrosta...

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Abstract

The invention discloses a flat line type ion trap mass analyzer based on an MEMS (micro electro mechanical system) process and a manufacturing method thereof. The flat line type ion trap mass analyzer based on the MEMS (micro electro mechanical system) process comprises a substrate, a support beam, an ion focusing electrode, a front gate electrode, a main radio frequency electrode, an auxiliary radio frequency electrode, a rear gate electrode, an ion exit repulsion electrode and an ion exit, wherein the integrated ion focusing electrode reduces ion loss, and the ion capture rate is improved; compared with an external ion focusing lens, an error caused by assembling accuracy is reduced; and the manufacturing method adopts the MEMS process, and the processing accuracy and the yield are improved, thus batch production is easy to realize.

Description

technical field [0001] The invention relates to the field of ion trap mass spectrometers used for material composition determination, in particular to a flat linear ion trap mass analyzer based on MEMS technology and a manufacturing method thereof. Background technique [0002] Ion trap mass spectrometer (ITMS) is an analysis and detection instrument that is convenient for miniaturization and realizes online and rapid on-site detection of unknown substance components. It is used in many fields such as food safety, environmental monitoring, scientific research, and national defense security. The ion trap mass analyzer is a key component of ITMS, which is used to trap and screen ions. The quality of the ion trap mass analyzer directly determines the performance of the ITMS, while the structure and processing difficulty of the ion trap mass analyzer directly affect the cost of the ITMS. The Flat Linear Ion Trap Mass Analyzer (PLITMA) is a simple ion trap mass analyzer proposed...

Claims

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Application Information

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IPC IPC(8): H01J49/42G01N27/62B81B7/00B81C1/00
Inventor 程玉鹏陈池来孔德义李庄刘英殷世平赵贵赵聪孙文娟钱玉洁王电令刘友江陈然段秀华
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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