Method for generating nano-copper particles on the surface of copper alloy film

A nano-copper and copper alloy technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of long experimental period, Cu particle pollution, unsuitable for industrialization development needs, etc., and the method is simple , low cost effect

Inactive Publication Date: 2011-12-14
HENAN UNIV OF SCI & TECH
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  • Abstract
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Problems solved by technology

Dhas et al. prepared Cu particles with a diameter of 200-250 nm by hydrothermal reduction method. This method involves many preparation steps and process parameters, and the experiment period is long.
In addition, pure Cu particles can also be prepared by traditional sputtering methods, but the size of the prepared pure Cu particles is limited. Once the particle size exceeds a dozen nanometers, the particles will connect to each other to form a thin film.
Based on the current research status, it can be seen that although submicron and nanoscale copper particles can be prepared by various methods in the laboratory, the prepared copper particles are basically free monodisperse particles or agglomerated particles. Together, it is difficult to fix

Method used

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  • Method for generating nano-copper particles on the surface of copper alloy film
  • Method for generating nano-copper particles on the surface of copper alloy film
  • Method for generating nano-copper particles on the surface of copper alloy film

Examples

Experimental program
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Effect test

Embodiment 1

[0071] First deposit Cu-Zr alloy film on polyimide PI substrate to form Cu-Zr / PI film-based system;

[0072] Then, for the prepared film-based system, the vacuum degree is better than 1*10 -3 Under the conditions, the temperature is 100-400 ° C, annealing for 5-10 minutes, so that pure Cu particles with nanometer or submicron scale are formed on the surface of the polyimide substrate film; or the prepared copper particles are oxidized to achieve oxidation. copper particles.

[0073] at a temperature of 360°C and 2 x 10 -4 Under the condition of Pa vacuum, the Cu-13.3 at. % Zr alloy film with a thickness of 50 nanometers on the polyimide substrate was annealed for 60 minutes to promote Cu atoms in the alloy film to precipitate, nucleate and grow into nanoscale Cu particles on the surface. Statistical results show that the average particle size is about 85 nanometers, and the particle spacing is relatively uniform.

Embodiment 2

[0075] at a temperature of 330°C and 2 x 10 -4 Under Pa vacuum condition, the 50nm thick Cu-23.6 at. % Zr alloy film on the polyimide substrate was annealed for 60 minutes to promote the Cu atoms in the alloy film to precipitate, nucleate and grow into nanoscale Cu particles on the surface, Statistical results show that the average particle size is about 45 nanometers, the particle distribution is relatively dense, and the spacing is relatively uniform.

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Abstract

The method for generating nano-copper particles on the surface of a copper alloy film adopts the following steps: 1. First, deposit a Cu-Zr alloy film on a polyimide PI substrate to form a Cu-Zr/PI film-based system; 2. Then prepare the Cu-Zr alloy film The film-based system, under the condition that the vacuum degree is better than 1*10-3, the temperature is 100-400 ° C, annealed for 5-10 minutes, so that pure Cu particles with nanometer or submicron scale are formed on the surface of the polyimide matrix film. ; or by oxidizing the prepared copper particles to achieve copper oxide particles. The beneficial effects of the present invention: the method is simple, the cost is low, and it is easy to prepare large-area, high-density, and scale-controllable nano-scale pure Cu particles or oxide particles on the surface of the film; the prepared pure Cu particles or oxide particles can be used to prepare Flexible electronic devices and photoelectric display devices; the preparation method of the present invention can also provide reference for the preparation of other metal particles with similar properties.

Description

[0001] technical field [0002] The invention relates to the preparation technology of nanometer materials, in particular to a method for preparing nanometer pure copper particles on the Cu-Zr surface of polyimide substrate copper-zirconium alloy film. Background technique [0003] With the development of submicron science and technology, the excellent properties and broad application prospects of micron and nanoparticle are gradually recognized by researchers and have aroused great interest of materials scientists, physicists and chemists all over the world. When the size reaches the nanometer level, the particles will show obvious quantum size effect, small size effect, surface effect and macroscopic quantum tunneling effect, and have broad application prospects in the fields of catalysis, light filtering, light absorption, medicine, magnetic media and new materials. . [0004] Due to good comprehensive performance and cost advantages, pure copper Cu and its alloy materia...

Claims

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Application Information

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IPC IPC(8): B22F9/02C23C14/20C23C14/58
Inventor 孙浩亮魏明宋忠孝徐可为展京美马飞
Owner HENAN UNIV OF SCI & TECH
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