Wide spectrum metal multilayer dielectric grating based on non-normalized film structure
A metal medium and film structure technology, applied in the field of diffraction gratings, can solve the problems of physical damage of gratings, insufficient diffraction performance of gratings, and inability to meet the bandwidth requirements of ultra-short laser pulses.
Inactive Publication Date: 2013-06-05
QINGDAO UNIV
View PDF4 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] However, with the increase of the number of film layers in the film stack, the internal stress of the grating also increases accordingly, which makes the grating vulnerable to physical damage and causes the diffraction performance of the grating to be unstable.
[0005] Due to the dispersion effect of ultrashort laser pulses, pulse width compression gratings are required to have a wider spectral range, and MDG has been unable to meet the bandwidth requirements of ultrashort laser pulses
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0016] The wide-spectrum metal dielectric film grating structure proposed by the present invention is as follows: figure 1 As shown, the wide-spectrum metal dielectric film grating sequentially includes a substrate 7, a metal Cr film 6, a metal Ag film 5, and a high refractive index TiO film from bottom to top. 2 Dielectric film 4, low refractive index SiO 2 Dielectric film 3, remaining film layer 2 and surface grating structure 1; said metal Ag film 5, high refractive index TiO 2 Dielectric film 4 and low refractive index SiO 2 The dielectric film 3 forms a high reflection film 8; the remaining film layer 2 and the surface grating structure are both HfO 2 Material.
[0017] Metal Ag film, high refractive index TiO 2 Dielectric film and low refractive index SiO 2 The high reflection film composed of dielectric film can provide high reflectivity in a wide enough spectral range to ensure that the incident light can be fully reflected and diffracted. The grating adopts a su...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| wavelength | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Login to View More
Abstract
The invention relates to a wide spectrum metal multilayer dielectric grating based on a non-normalized film structure, especially to a wide spectrum metal multilayer dielectric grating used for a 1053 nanometer femto second laser pulse amplification system. According to the invention, a thickness of a high reflective film employs a non-normalized film structure; when a grating period is 1480 line / millimeters, an etching depth is 400 nanometers, the thickness of a residual film is 200 nanometers, a duty ratio is 0.2, and an incident angle is 58 degrees, with regard to a TE wave with a centralwave length of 1053 nanometers, the wide spectrum metal multilayer dielectric grating provided in the invention is superior in a range of from 980 nanometers to 1140 nanometers of a -1 level diffraction efficiency and an effective working bandwidth reaches 160 nanometers. Besides, the grating provided in the invention can be manufactured by an optical holographic and ion beam etching technology. According to the invention, the grating has an important application value on improvement of a performance of a chirped-pulse amplification system.
Description
technical field [0001] The invention relates to a metal dielectric film grating applied to a femtosecond laser pulse amplification system, in particular to a wide-spectrum metal dielectric film grating based on an irregular film layer structure used in a 1053 nanometer femtosecond laser pulse amplification system, which belongs to diffraction Raster technology field. Background technique [0002] With the development of laser technology and application requirements, the acquisition of high peak and ultrashort laser pulses has gradually become an important means to explore the interaction between light and matter. The pulse compression grating (Pulse Compression Grating, PCG) as the core component of the CPA system should have the highest possible diffraction efficiency, laser damage threshold and spectral range. [0003] Multi-layer dielectric grating (Multi-layer Dielectric Grating, MDG) has been focused on research and widely used due to its advantages of high diffraction...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B1/10B32B15/04B32B9/04
Inventor 孔伟金云茂金张文飞滕冰刘均海孙欣陈沙鸥
Owner QINGDAO UNIV