Method for selectively reducing graphene oxide by using hindered amine light stabilizer

Abstract

The invention relates to a selectively reduced graphene oxide material and a preparation method thereof, belonging to the field of nano science and technology. The invention particularly relates to a technology for preparing a soluble reduced graphene material through a hindered amine light stabilizer catalytic method under the radiation of ultraviolet light. The hindered amine light stabilizer catalytic reduction method provided by the invention has the characteristics that: 1) the group selectivity is high, and carboxyl groups and carbonyl groups can be selectively removed; 2) the product solubility is good; 3) hindered amine catalysts are nontoxic and metal-free; 4) hindered amine additives have the ability of dispersing graphene and can also remove the graphene; and 5) the operating method is simple, environment-friendly and the like. The technology well makes up the defects of high toxicity, high energy consumption (such as high temperature) and uncontrollable reduction process of the traditional graphene oxide material reduction method, is expected to become an important step for the chemical and industrial production of graphene materials, and has a potential of being widely applied to graphene photoelectric materials, graphene organic structural materials and organic photoelectric functional devices, especially the graphene photoelectric materials.

Description

technical field [0001] The invention belongs to the technical field of nanometer material chemistry. It specifically relates to a technology for preparing carboxyl-free soluble graphene materials by UV-induced steric hindered amine light stabilizer catalysis at room temperature, which has attractive application value in the production of graphene-based photoelectric materials and graphene-based organic structural materials. Background technique [0002] Graphene and its derivative materials are widely used in many fields, such as organic optoelectronic materials, carbon-based semiconductor materials, electrode materials for organic optoelectronic functional devices, active layer materials, etc. Currently, the most commonly used graphene material preparation methods are chemical vapor deposition (CVD) and chemical exfoliation (Chemical Exfoliation). Chemical vapor deposition can produce high-quality, large-area graphene, and has the potential to produce high-quality graphene...

AI Technical Summary

Problems solved by technology

However, high-temperature reduction of graphene materials requires high-temperature resistance of the structural host, which greatly limits the preparation of graphene-based blend materials, especially the preparation of graphene-based organic / polymer blend materials.

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