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ITO (indium tin oxide) membrane photoetching automatic recognition positioning method

A technology of automatic identification and positioning method, which is applied in the direction of microlithography exposure equipment, optics, photoplate making process exposure device, etc., which can solve the problems of CCD photosensitive element, such as poor light sensitivity, impact on accuracy, and weak reflection, and achieve clear patterns , improve the processing quality, the effect of simple structure

Inactive Publication Date: 2012-02-01
DONGGUAN RUNHUA OPTOELECTRONICS
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Problems solved by technology

Therefore, the provision of the light source has a great influence on the accuracy of CCD optical vision positioning. The existing light source is generally made of incandescent lamps and infrared lighting devices, but the ITO film does not reflect these light strongly, resulting in the CCD photosensitive element not being strong. The positioning is accurate to 10 μm, which is difficult to meet people's desire for the increasing quality of touch screen products

Method used

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  • ITO (indium tin oxide) membrane photoetching automatic recognition positioning method
  • ITO (indium tin oxide) membrane photoetching automatic recognition positioning method
  • ITO (indium tin oxide) membrane photoetching automatic recognition positioning method

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Embodiment Construction

[0013] Such as figure 1 , 2 As shown, a method for automatic identification and positioning of ITO film lithography, which includes the following steps: two UV light sources 1 with a power of 3.5W and a wavelength of 365nM, two sets of CCD imaging equipment 3 and two sets of imaging optical systems 2 Installed under the reticle 4 and the ITO diaphragm 5 covered with photoresist, two sets of CCD imaging equipment 2 capture the reticle alignment mark 6 and the diaphragm alignment mark 7 through two sets of imaging optical systems 3, and the image acquisition The image data is collected by the card 8, input to the computer 9 for processing, positioning and real-time display of the alignment mark image, and adjusting the relative position error of the reticle alignment mark 6 and the diaphragm alignment mark 7 images displayed on the screen of the computer 9 The position of the diaphragm 5, so as to realize automatic and precise alignment between the diaphragm 5 and the reticle 4...

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Abstract

The invention discloses an ITO (indium tin oxide) membrane photoetching automatic recognition positioning method. The method is characterized in that two ultraviolet light sources, two sets of CCD (charge coupled device) imaging devices and two sets of imaging optical systems are arranged under a mask plate and a membrane; two sets of CCD imaging devices shot the left and right alignment marks at the bottoms of the mask plate and the membrane through two sets of imaging optical systems, an image acquiring card acquires image data and inputs the image data to a computer to process, position and real-time display the alignment mark images, and a position of the membrane is regulated through a relative position error of the left and right alignment mark images of the mask plate and the membrane displayed on the screen of the computer, thereby automatically and accurately aligning the membrane and the mask plate. The ITO membrane photoetching automatic recognition positioning method has simple structure, convenience for operation, high automatic imaging clear accuracy of 3-5 microns and high photoetching processing quality.

Description

technical field [0001] The invention relates to the technical field of microelectronic lithography equipment, in particular to a method for automatic identification and positioning in ITO film lithography. Background technique [0002] With the continuous development of the touch screen and liquid crystal display industry, the demand for the performance of ITO film substrates continues to increase, and the processing methods of ITO films have also changed. In the prior art, due to the structural layout of processing equipment, the ITO film The processing efficiency of the photoelectric coupling device (CCD) has been stable and reliable, the image is clear, the sensitivity and the resolution are high since the advent of the photoelectric coupled device (charge coupled device, CCD). The application field is more extensive. The so-called CCD optical visual positioning is to use the camera lens to scan, and then convert the light wave reflected from the image into a digital ele...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 周学卿
Owner DONGGUAN RUNHUA OPTOELECTRONICS
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