A method of manufacturing embedded flash memory
A manufacturing method and embedded technology, applied in the direction of electrical components, electrical solid devices, circuits, etc., can solve the problem that the silicon nitride layer is difficult to remove, and achieve the effect of improving efficiency
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[0014] The method for manufacturing an embedded flash memory provided by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. According to the following description and claims, the advantages and features of the present invention will be clearer. It should be noted that the drawings all adopt a very simplified form and all use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
[0015] The core idea of the present invention is to provide a method for manufacturing an embedded flash memory. A silicon nitride layer is deposited twice on the floating gate polysilicon layer and the shallow trench isolation, that is, the second silicon nitride layer and the third silicon nitride layer And after the second silicon nitride layer is deposited, the surface of the second silicon nitride layer is planarized, and...
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