Silica sol with double grain diameters and preparation method thereof

A silicon dioxide, double particle size technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of micro-defects on the polished surface, and achieve the effect of simple method, improved polishing rate, and wide application

Active Publication Date: 2012-03-14
JIANGSU HAIXUN IND GROUP SHARE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a double particle size silica sol for CMP abrasive and its preparation method to solve the problem of micro-defects in the rate of planarization and the polishing surface

Method used

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  • Silica sol with double grain diameters and preparation method thereof
  • Silica sol with double grain diameters and preparation method thereof
  • Silica sol with double grain diameters and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Alkaline silica sol with a particle size of 80 nm is used as the raw material, the specific gravity is 1.16, diluted with 20 times the volume of distilled water, and the mass fraction is 10% sodium hydroxide as the catalyst. Constant, the stirring speed is 300 revolutions per minute, after the reaction time reaches 40 h, the pH is distilled under reduced pressure to reach 1.3, and the stirring is stopped after 2 hours of heat preservation to obtain a double particle size silica sol. From figure 2 It can be seen that the supported silica sol has two particle sizes, and it is a double particle size silica sol.

[0031] The basic parameters of the double particle size silica sol obtained by the reaction are shown in Table 1 (the percentage in brackets is the proportion of the number of particles):

[0032] Table 1

[0033] Test items Test Results testing method pH value 9.7 pH acidity meter Silica specific gravity 1.3 Hydrometer viscos...

Embodiment 2

[0035] Alkaline silica sol with a particle size of 80 nm is used as the raw material, and the specific gravity is 1.16. It is diluted with 10 times the volume of distilled water, and the mass fraction is 10% sodium hydroxide as the catalyst. Constant, the stirring speed is 300 rpm, the reaction time is 30 hours, and then the pH is distilled under reduced pressure to reach 1.3, and the stirring is stopped after 2 hours of heat preservation to obtain a double particle size silica sol.

[0036] The basic parameters of the double particle size silica sol obtained by the reaction are shown in Table 2 (the percentage in parentheses is the proportion of the number of particles):

[0037] Table 2

[0038] Test items Test Results testing method pH value 9.8 pH acidity meter Silica concentration 1.31 Hydrometer viscosity 3.8 mPa s Viscometer a particle size range 70 nm (about 30%) TEM Two particle size range 190 nm (about 70%) TEM...

Embodiment 3

[0040] Alkaline silica sol with a particle size of 80 nm is used as the raw material, the specific gravity is 1.16, diluted with 20 times the volume of distilled water, and the mass fraction is 10% sodium hydroxide as the catalyst. Constant, the stirring speed is 300 revolutions per minute, after the reaction time reaches 35 h, the pH is distilled under reduced pressure to reach 1.3, and the stirring is stopped after 2 hours of heat preservation to obtain a double particle size silica sol.

[0041] The basic parameters of the double particle size silica sol obtained by the reaction are shown in Table 3 (the percentage in brackets is the proportion of the number of particles):

[0042] table 3

[0043] Test items Test Results testing method pH value 9.8 pH acidity meter Silica concentration 1.31 Hydrometer viscosity 3.7 mPa s Viscometer a particle size range 75 nm (approximately 25%) TEM Two particle size range 180 nm (abou...

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Abstract

The invention provides a silica sol with double grain diameters. The silica sol comprises two grain diameter ranges, one grain diameter range is 50-100 nm, and the other grain diameter range is 150-200nm. The invention also provides a method for preparing the silica sol with the double grain diameters. The silica sol is prepared by using alkaline silica sol with uniform grain diameter, a size being 80nm and a specific gravity being 1.15-1.25 as a seed crystal. The preparation method of the silica sol with the double grain diameters is simple; and the prepared silica sol has long storage period and is suitable for chemical-mechanical polishing of metals, semiconductors, memory hard disk substrates, compound crystals, precise instruments and the like.

Description

technical field [0001] The invention relates to an abrasive material for chemical mechanical polishing, in particular to a double particle diameter silica sol and a preparation method thereof. Background technique [0002] Chemical-mechanical polishing (CMP) was originally a new technology developed by IBM in the mid-1980s. It is currently almost the only technology that can provide global planarization. It has developed rapidly in the past ten years. Its basic operation is , in the presence of a certain pressure and polishing fluid, the object to be polished moves relative to the polishing pad. It is a process of comprehensive application of physical, mechanical and chemical effects. In the grinding process, the friction of nanoparticles and the chemical corrosion of oxidants are used. Function, form a smooth surface on the surface of the workpiece to be ground, and realize the global planarization of the polished object. CMP technology has realized the grinding of Cu, Ta ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/14C01B33/113
Inventor 李家荣关飞飞王航波
Owner JIANGSU HAIXUN IND GROUP SHARE
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