Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof

Abstract

The invention which relates to a double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and a method thereof belongs to the technical field of semiconductor manufacturing equipment. The apparatus is characterized in that: the apparatus comprises workpiece benches which operate on a prealigned station and an exposure station; the prealigned station and the exposure station are respectively provided with a well type driving unit which comprises a two side X-directional liner motion unit and a two side Y-directional liner motion unit; two Y-directional transitional liner motion units are arranged between the two well type driving units; and the bench replacement of the double-workpiece bench is completed through the butt joint of the Y-directional liner motion unit and the X-directional liner motion unit. According to the invention, the two workpiece benches are driven in the prealigned station and the exposure station in a dual side mass center mode, so the system angle rigidity is increased; only three beats are needed to exchange the two workpiece benches between the prealigned station and the exposure station, so the lithography efficiency is improved; and the apparatus has the advantages of small motion inertial, short stable time, large structure rigidity and the like in the concrete embodiment process.

Description

technical field [0001] The invention belongs to semiconductor manufacturing equipment, and mainly relates to a three-beat double-workpiece table exchange device and method based on double guide rails and double drives. Background technique [0002] The lithography machine is one of the important ultra-precision system engineering equipment in semiconductor chip manufacturing. As the current mainstream lithography technology, the step-and-scan type puts forward higher requirements for the motion performance of the workpiece table. The main function of the workpiece table is to carry the wafer under the condition of high speed and high acceleration to achieve nanoscale positioning, complete the processes of loading and unloading, pre-alignment, and alignment in the photolithography process, and cooperate with the mask table to complete the exposure action. Worktable technology plays a vital role in improving the resolution, overlay accuracy and productivity of lithography mach...

AI Technical Summary

Problems solved by technology

In the patent CN101201555, the conveyor belt and the docking slider are used to complete the stage changing process, the movement rhythm is small, and the operation and maintenance are simple. However, the conveyor belt mechanism and the docking slider are fixed on the abutment, so there will be a large force during the stage changing process On the abutment, it has a great influence on the overall dynamic performance

In the patent CN1485694, the table-changing operation is completed by the docking of the Y-direction linear motor and the linear guide rail. However, due to the excessive gap in the middle of the abutment, a bridging device is introduced, which increases the movement rhythm and increases the time for table-changing. At the same time, the X-direction linear motor magnetically The steel part is fixed on the abutment, and the movement of the moving parts will generate a large reaction force on the abutment when the platform is changed, which in turn affects the dynamic performance of the entire system

In the patent CN101770181, the docking of the replacement unit is used to complete the work of changing the platform, but the guide device is fixed on the abutment. During the movement of changing the platform, the moving parts will generate a large reaction force on the abutment, which in turn affects the dynamic performance of the entire system.

Therefore, the current dual-platform solution needs to be improved.

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