Transfer plate with metal vertical interconnection structure and manufacture method thereof
A technology of vertical interconnection and manufacturing method, applied in the field of three-dimensional stacking, can solve the problems of complex process and high cost of manufacturing three-dimensional stacked chips, and achieve the effects of simplified process steps, simple structure and convenient operation.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0043]
[0044] First, refer to figure 1 The first embodiment of the metal vertical interconnection structure applied to three-dimensional stacked chips disclosed in the present invention will be introduced. This embodiment 1 is a specific structure when the present invention is applied to an interposer.
[0045] In such figure 1 The shown transition board structure includes a substrate 101. In this embodiment, the material of the substrate 101 is glass, but it can also be silicon or organic material. There is a passivation layer 102 on the lower surface of the substrate 101. The material of the passivation layer 102 is polyimide in this embodiment. There is a metal bump structure on the lower surface side of the passivation layer 102. The metal bump structure includes a pad 104 buried in the passivation layer 102. There is a metal bump 103 on the lower surface of the pad 104. . In this embodiment, the pad 104 is made of metal aluminum. In this embodiment, the material of th...
Example Embodiment
[0054]
[0055] image 3 The metal vertical interconnection structure applied to a three-dimensional stacked chip according to Embodiment 2 of the present invention is depicted. Specifically, the second embodiment is also a specific structure when the present invention is applied to an interposer.
[0056] In such image 3 The interposer board shown includes a substrate 206. In the second embodiment, the substrate 206 is a 4-inch silicon wafer with a thickness of 200 microns. Optionally, the material of the substrate 206 may also be glass or organic material. There is a passivation layer 205 on the lower surface of the substrate 206. There is a metal bump structure in the passivation layer 205, a part of the metal bump structure is embedded in the passivation layer 205, and the other part protrudes from the lower surface of the passivation layer 205.
[0057] Specifically, the metal bump structure includes a pad 204, an underlying metal layer 203, a metal pillar 202, and a solde...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap