Unlock instant, AI-driven research and patent intelligence for your innovation.

thin film structure

A thin-film structure and thin-film technology, applied in optics, instruments, optical components, etc., can solve problems such as operator and environmental damage and pollution

Inactive Publication Date: 2016-08-03
CHINA STEEL
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, to form the above-mentioned white paint film, the process of spraying paint will cause damage and pollution to operators and the environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • thin film structure
  • thin film structure
  • thin film structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] First, a tin target material is provided, the purity of which is 99%, and the used tin target material is a tin target material with a diameter of six. Next, a ceramic substrate with a smooth and flat surface is provided. Subsequently, the ceramic substrate was placed in a vacuum magnetron sputtering chamber, and an argon gas was introduced into the chamber, and the flow rate of the introduced argon gas was set to 20 sccm. Then, the above-mentioned tin target was sputtered onto the ceramic substrate with a DC magnetron target, and the sputtering power was set to 700 watts. The area of ​​the tin foil film test piece deposited on the surface of the corresponding ceramic substrate is 25 cm*25 cm and the thickness is 900 nm. The deposition area and thickness of the above-mentioned test piece are only used for testing purposes and are not intended to limit the present invention, and the deposited area and thickness will not affect the coloration of the film. Then use atomi...

Embodiment 2

[0051] First, an aluminum target is provided, the purity of which is 99%, and the used aluminum target is an aluminum target with a diameter of two. Next, a glass substrate with a smooth and flat surface is provided. Subsequently, the glass substrate was placed in a vacuum magnetron sputtering chamber, and an argon gas was introduced into the chamber, wherein the flow rate of the introduced argon gas was set to 15 sccm. Then, the above-mentioned aluminum target was sputtered onto the glass substrate with a DC magnetron target, and the sputtering power was set to 50 watts. The aluminum thin film test piece deposited on the surface of the corresponding glass substrate has an area of ​​25 cm*25 cm and a thickness of 1000 nm. The deposition area and thickness of the above-mentioned test piece are only used for testing purposes and are not intended to limit the present invention, and the deposited area and thickness will not affect the coloration of the film. Then use atomic forc...

Embodiment 3

[0055]First, an indium target material is provided, the purity of which is 99%, and the used indium target material is an indium target material with a diameter of six. Next, a stainless steel substrate with a smooth and flat surface is provided. Subsequently, the stainless steel substrate was placed in a vacuum magnetron sputtering chamber, and an argon gas was introduced into the chamber, and the flow rate of the introduced argon gas was set at 20 sccm. Then, the above-mentioned indium target was sputtered onto the stainless steel substrate with a DC magnetron target, and the sputtering power was set to 500 watts. The area of ​​the indium film test piece deposited on the surface of the corresponding stainless steel substrate is 50 cm*50 cm and the thickness is 1200 nm. The deposition area and thickness of the above test piece are only for testing purposes, not for limiting the present invention. The deposited area and thickness did not affect the color rendering of the film...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
wavelengthaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a film structure, which comprises a substrate and a metal film, wherein the metal film is formed on the substrate with a physical vapor deposition method; the bottom diameters of particles for forming the metal film are substantially 0.05-2 micrometers; the height of the particles for forming the metal film is substantially between 0.05-3 micrometers; the brightness of the metal film in a visible light area (wavelengths of 380-770 nanometers) is substantially 65-90; the first chroma of the metal film is substantially between -2.1 and 2.1; and the second chroma of the metal film is substantially between -2.1 and 2.1.

Description

technical field [0001] The present invention relates to a thin film structure, and in particular to a thin film structure having a white surface. Background technique [0002] With the rapid development of science and technology, people's requirements for electronic products are getting higher and higher, from light, thin and short to even requirements for product shells to have metal texture and even color requirements. The performance of color needs to pass through light. Light can be divided into ultraviolet, infrared, visible light and other forms of energy according to wavelength or frequency. Visible light covers all wavelengths from 380nm to 770nm, and can also be divided into red, orange, and yellow according to the length of the wavelength. , green, blue, and violet light, of which violet light has the shortest wavelength and red light the longest. Among them, white light is composed of all the light with different wavelengths and equivalent energy in the visible s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/14G02B5/02G02B1/10
Inventor 董寰乾李至隆邱军浩
Owner CHINA STEEL