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Advanced process control system and test method thereof

A technology of advanced process control and process control module, applied in general control system, control/regulation system, adaptive control, etc., can solve the problems of accelerating system development, difficult testing and verification, and reducing system development cost, etc., to achieve easier Effects of reproducibility, lower testing and validation costs, and shorter development cycles

Active Publication Date: 2012-07-04
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0007] In order to solve one or more of the above-mentioned problems, the present invention provides an advanced process control system and its testing method to overcome the problem that the advanced process control system is not easy to test and verify, accelerate system development, and reduce system development costs

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  • Advanced process control system and test method thereof
  • Advanced process control system and test method thereof
  • Advanced process control system and test method thereof

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Embodiment Construction

[0019] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings. While illustrations of parameters including particular values ​​may be provided herein, it should be understood that parameters need not be exactly equal to the corresponding values, but rather may approximate the values ​​within acceptable error margins or design constraints.

[0020] Virtual Manufacturing Fab (Virtual Manufacturing Fab, referred to as: Virtual Fab) is a technology that simulates and predicts possible problems in various aspects such as product function, performance and manufacturability through computer virtual models. Before the product is actually produced, first generate a soft product prototype (Soft Prototype) in the virtual manufacturing environment instead of the traditional hard sample (Hard Protot...

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Abstract

The invention discloses an advanced process control system and a test method of the advanced process control system. The advanced process control system is connected with a virtual manufacturing system and comprises a real-time error detection module, an error classifying and responding module and a feedback / feedback control module, wherein the real-time error detection module is used for acquiring performance parameters of a product in a virtual manufacturing process from a dada acquisition module of the virtual manufacturing system, comparing the performance parameters of the product with preset performance parameters of the product, and performing error detection on the performance parameters of the product in the virtual manufacturing process; the error classifying and responding module is used for classifying the detected errors and researching reasons for generating the errors; and the feedback / feedback control module is used for invoking a corresponding correcting model to correct technical / equipment parameters related to the errors so as to obtain the corrected technical / equipment parameters and sending the corrected technical / equipment parameters to a process control module of the virtual manufacturing system. The problems that much time is used and manufacturing equipment cannot work normally when the advanced process control system is embedded into an actual process line are solved, and the cost for test and verification of the advanced process control system is reduced.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing in the microelectronics industry, in particular to an Advanced Process Control (APC for short) system and a testing method thereof. Background technique [0002] As the semiconductor process enters 45nm, on the one hand, the investment cost of integrated circuit production lines continues to rise. In order to recover the investment cost as soon as possible, it is necessary to continuously improve the production efficiency of equipment; on the other hand, the process window of semiconductor device processing is getting smaller and smaller. Manufacturers of integrated circuit equipment and testing equipment have put forward stricter process control requirements. The previous statistical process control (Statistical Process Control, referred to as SPC) and a single parameter control method can no longer meet the current technological requirements. In order to improve the production ef...

Claims

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Application Information

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IPC IPC(8): G05B13/04G05B23/02
Inventor 方晶晶陈岚阮文彪
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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