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Electrical component and method for manufacturing electrical components

A technology of electrical components and manufacturing methods, which is applied in the directions of electrical components, electrical solid-state devices, semiconductor/solid-state device components, etc., can solve the problems of deviation in the quality of electrical components, difficulty in fully suppressing metal whiskers, etc., so as to suppress the occurrence of metal whiskers. Effect

Active Publication Date: 2012-07-11
OM SANGYO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when these conventional methods are used, the quality of the obtained electrical components may vary due to scattering of other metals in the tin or tin alloy grain boundaries or etching of the material to be plated.
It is also difficult to sufficiently suppress the occurrence of metal whiskers under the state of external stress applied to electrical components

Method used

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  • Electrical component and method for manufacturing electrical components
  • Electrical component and method for manufacturing electrical components
  • Electrical component and method for manufacturing electrical components

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0066] As the base material, a phosphor bronze tape formed by connecting a plurality of parts that should serve as contacts for the post via connecting parts was used. After the degreasing and acid cleaning of the phosphor bronze strip, copper strike plating (plating thickness 0.1 μm) was carried out, and nickel plating (plating thickness 2.0 μm) was carried out on it to obtain an undercoating layer with a total thickness of about 2 μm. Palladium plating was performed on this bottom plating layer to obtain an intermediate plating layer with a thickness of 0.05 μm. By performing tin plating with a thickness of 3 μm on the obtained intermediate plating layer, a surface plating layer with a thickness of about 3 μm was obtained. In addition, these respective plating steps were carried out by strip plating, PD-LF-800 manufactured by N.E. Chemcat Co., Ltd. was used as a palladium plating solution, and SBS-M manufactured by Yuken Kogyo Co., Ltd. was used as a tin plating solution. I...

Embodiment 2

[0069] Tape 1 obtained in Example 1 was introduced into a simple reflow furnace, and tape 2 was obtained by annealing at a peak temperature of 225° C. for 2 minutes. The cross-sectional observation of the obtained tape 2 was performed by the same method as in Example 1. exist Figure 4 The middle shows the micrograph of the cross-section of the observed part. exist Figure 4 Among them, 41 represents the nickel bottom layer, 42 represents the diffusion layer as an intermediate layer, and 43 represents the tin surface layer.

Embodiment 3

[0071] Tape 1 obtained in Example 1 was introduced into a simple reflow furnace, and tape 3 was obtained by reflowing at a peak temperature of 310° C. for 2 seconds. The cross-sectional observation of the obtained tape 3 was performed by the same method as in Example 1. exist Figure 5 (a) shows a micrograph of the section of the observed site. exist Figure 5 In (a), 51 denotes a nickel underlayer, 52 denotes a tin-palladium diffusion layer as an intermediate layer, and 53 denotes a surface layer. In addition, in the surface layer 53, 54 is a tin phase, and 55 is a tin-palladium alloy phase. In addition, the surface of the tape 3 was observed with an X-ray diffraction device. exist Figure 5 (b) shows the obtained X-ray diffraction pattern. It was confirmed that the equivalent of PdSn 4 peaks exist.

[0072] From Example 2, it was confirmed that the diffusion layer 42 was formed between the surface layer 43 and the bottom layer 41 by performing annealing treatment aft...

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Abstract

Provided is a method for manufacturing electrical components, said method comprising a step in which a middle plating layer comprising palladium or a palladium alloy is formed on top of a substrate, and a step in which a surface plating layer comprising tin or a tin alloy containing metals other than palladium is formed on top of the middle plating layer. This allows the provision of an electronic component having a surface layer comprising mainly tin, whereby whisker formation is inhibited over a long period of time even if the component is under stress.

Description

technical field [0001] The present invention relates to an electrical component having a plating layer containing tin or a tin alloy on the surface of a base material and a manufacturing method thereof. In particular, it relates to an electric component on which terminals, terminals, flip-chip flexible substrates, etc. are mounted, capable of suppressing occurrence of metal whiskers from the above-mentioned plating layer, and a method for manufacturing the same. Background technique [0002] In electrical components such as terminals, terminals, and lead frames of semiconductor integrated circuits, the surface is plated with tin as the main component for the purpose of preventing oxidation, reducing contact resistance, and improving solder wettability. As such an alloy for plating, tin-lead alloy plating has conventionally been suitably used. However, starting from the demand for lead-free electric-electronic components, plating treatment with tin alone or with lead-free ti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D7/00C25D5/10C25D5/12
CPCC25D3/30C25D5/12H01L2924/0002C25D5/50C25D5/48H01L23/49582C25D3/60H01R13/03C25D3/50C25D5/10Y10T428/12528C25D5/617H01L2924/00
Inventor 高见泽政男仲俊秀剑持仁志西村宜幸
Owner OM SANGYO